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  2. History of the transistor - Wikipedia

    en.wikipedia.org/wiki/History_of_the_transistor

    The introduction of the transistor is often considered one of the most important inventions in history. [1] [2] Transistors are broadly classified into two categories: bipolar junction transistor (BJT) and field-effect transistor (FET). [3] The principle of a field-effect transistor was proposed by Julius Edgar Lilienfeld in 1925. [4]

  3. Transistor - Wikipedia

    en.wikipedia.org/wiki/Transistor

    The bipolar junction transistor, the first type of transistor to be mass-produced, is a combination of two junction diodes and is formed of either a thin layer of p-type semiconductor sandwiched between two n-type semiconductors (an n–p–n transistor), or a thin layer of n-type semiconductor sandwiched between two p-type semiconductors (a p ...

  4. Drain-induced barrier lowering - Wikipedia

    en.wikipedia.org/wiki/Drain-induced_barrier_lowering

    As a result, the charge present on the gate retains charge balance by attracting more carriers into the channel, an effect equivalent to lowering the threshold voltage of the device. In effect, the channel becomes more attractive for electrons. In other words, the potential energy barrier for electrons in the channel is lowered. Hence the term ...

  5. Point-contact transistor - Wikipedia

    en.wikipedia.org/wiki/Point-contact_transistor

    The common base current gain (or α) of a point-contact transistor is usually around 2 to 3, [4] whereas α of bipolar junction transistor (BJT) cannot exceed 1. The common emitter current gain (or β) of a point-contact transistor does not usually exceed 1, [4] whereas β of a BJT is typically between 20 and 200. Negative differential ...

  6. Floating body effect - Wikipedia

    en.wikipedia.org/wiki/Floating_body_effect

    The floating body effect is the effect of dependence of the body potential of a transistor realized by the silicon on insulator (SOI) technology on the history of its biasing and the carrier recombination processes. The transistor's body forms a capacitor against the insulated substrate.

  7. Charge trap flash - Wikipedia

    en.wikipedia.org/wiki/Charge_trap_flash

    The MNOS transistor device could be programmed through the application of a 50-volt forward or reverse bias between the gate and the channel to trap charges that would impact the threshold voltage of the transistor. Charge trap (CT) memory was introduced with MNOS devices in the late 1960s.

  8. Dawon Kahng - Wikipedia

    en.wikipedia.org/wiki/Dawon_Kahng

    The MOSFET is the most widely used type of transistor, and the basic element in most modern electronic equipment. Kahng and Atalla later proposed the concept of the MOS integrated circuit, and they did pioneering work on Schottky diodes and nanolayer-base transistors in the early 1960s.

  9. Gordon Kidd Teal - Wikipedia

    en.wikipedia.org/wiki/Gordon_Kidd_Teal

    Teal joined Bell Labs in 1930 and would remain employed there for 22 years. [1] During his time there, he continued to work with germanium and silicon. [1] When William Shockley's group at Bell Labs invented the transistor in 1947, Teal realized that substantial improvements in the device would result if it was fabricated using a single crystal, rather than the polycrystalline material then ...