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Molecular models of the different molecules active in Piranha solution: peroxysulfuric acid (H 2 SO 5) and hydrogen peroxide (H 2 O 2). Piranha solution, also known as piranha etch, is a mixture of sulfuric acid (H 2 SO 4) and hydrogen peroxide (H 2 O 2). The resulting mixture is used to clean organic residues off substrates, for example ...
Nitric acid is a powerful oxidizer, which will dissolve a very small quantity of gold, forming gold(III) ions (Au 3+). The hydrochloric acid provides a ready supply of chloride ions ( Cl − ), which react with the gold ions to produce tetrachloroaurate(III) anions ( [AuCl 4 ] − ), also in solution.
Glass frit products are not recommended for strongly alkaline solutions which can sometimes attack laboratory glass. Although such solutions only dissolve a negligible layer from the surface of ordinary labware, because frit particles are small, they expose a much larger surface area to the solution, and have tiny particle-contact areas ...
These legends refer specifically to the red-bellied piranha. [40] Piranha solution, a dangerous mixture of sulfuric acid and hydrogen peroxide known to aggressively dissolve organic material, draws its name from these legends surrounding the piranha fish. A common falsehood is that they can be attracted by blood and are exclusively carnivores. [41]
In absence of oxygen, e.g. in a flow of high-purity argon gas, diamond can be heated up to about 1700 °C. [48] [49] At high pressure (~20 GPa (2,900,000 psi)) diamond can be heated up to 2,500 °C (4,530 °F), [50] and a report published in 2009 suggests that diamond can withstand temperatures of 3,000 °C (5,430 °F) and above. [51]
Piranha solution in particular constitutes quite a harsh treatment that can potentially damage the integrity of the silicon surface. Finlayson-Pitts et al. investigated the effect of certain treatments on silicon and concluded that both the roughness (3-5 Å) and the presence of scattered large particles were preserved after 1 cycle of plasma ...
The optional second step (for bare silicon wafers) is a short immersion in a 1:100 or 1:50 solution of aqueous HF (hydrofluoric acid) at 25 °C for about fifteen seconds, in order to remove the thin oxide layer and some fraction of ionic contaminants. If this step is performed without ultra high purity materials and ultra clean containers, it ...
Using piranha solution to clean fritted glassware is a huge safety no-no and this article should not be proposing it as reasonable practice in any lab environment. 198.179.125.170 17:46, 14 November 2018 (UTC) Is the problem with piranha and frits, or with piranha and frits which still have organic solvents on them? Certainly the second has a ...