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Modern 3D Lichtenberg figures or "electrical treeing" in a block of clear acrylic, created by irradiating the block with an electron beam. Actual size: 80 mm × 80 mm × 50 mm (3 in × 3 in × 2 in) Lichtenberg figures are generated by a sliding spark discharge on the flask with a mixture of gases. Structural differences between the "positive ...
A pencil-beam radar A moving or sweeping pencil-beam radar. In optics, a pencil or pencil of rays, also known as a pencil beam or narrow beam, is a geometric construct (pencil of half-lines) used to describe a beam or portion of a beam of electromagnetic radiation or charged particles, typically in the form of a cone or cylinder.
Electron-beam machining is a process in which high-velocity electrons are concentrated into a narrow beam with a very high planar power density. The beam cross-section is then focused and directed toward the work piece, creating heat and vaporizing the material. Electron-beam machining can be used to accurately cut or bore a wide variety of metals.
Cathode rays or electron beams (e-beam) are streams of electrons observed in discharge tubes. If an evacuated glass tube is equipped with two electrodes and a voltage is applied, glass behind the positive electrode is observed to glow, due to electrons emitted from the cathode (the electrode connected to the negative terminal of the voltage ...
Kikuchi lines in a convergent beam diffraction pattern of single crystal silicon taken with a 300 keV electron beam. The figure on the left shows the Kikuchi lines leading to a silicon [100] zone, taken with the beam direction approximately 7.9° away from the zone along the (004) Kikuchi band.
Close to an aperture or atoms, often called the "sample", the electron wave would be described in terms of near field or Fresnel diffraction. [12]: Chpt 7-8 This has relevance for imaging within electron microscopes, [1]: Chpt 3 [2]: Chpt 3-4 whereas electron diffraction patterns are measured far from the sample, which is described as far-field or Fraunhofer diffraction. [12]:
The basic components of a typical electron-beam processing device include: [1] an electron gun (consisting of a cathode, grid, and anode), used to generate and accelerate the primary beam; and, a magnetic optical (focusing and deflection) system, used for controlling the way in which the electron beam impinges on the material being processed ...
Electron energy loss spectroscopy (EELS) is a form of electron microscopy in which a material is exposed to a beam of electrons with a known, narrow range of kinetic energies. Some of the electrons will undergo inelastic scattering , which means that they lose energy and have their paths slightly and randomly deflected.