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Layout view of a simple CMOS operational amplifier. In integrated circuit design, integrated circuit (IC) layout, also known IC mask layout or mask design, is the representation of an integrated circuit in terms of planar geometric shapes which correspond to the patterns of metal, oxide, or semiconductor layers that make up the components of the integrated circuit.
A Process design kit (PDK) may be provided by the foundry and it may include the standard cell library as well as the specifications of the cells, and tools to verify the fabless company's design against the design rules specified by the foundry as well as simulate it using the foundry's cells. PDKs may be provided under non-disclosure agreements.
The most basic design rules are shown in the diagram on the right. The first are single layer rules. A width rule specifies the minimum width of any shape in the design. A spacing rule specifies the minimum distance between two adjacent objects. These rules will exist for each layer of semiconductor manufacturing process, with the lowest layers ...
In semiconductor design, standard-cell methodology is a method of designing application-specific integrated circuits (ASICs) with mostly digital-logic features. Standard-cell methodology is an example of design abstraction, whereby a low-level very-large-scale integration layout is encapsulated into an abstract logic representation (such as a NAND gate).
The TR-808 is a piece of art. It's engineering art, it's so beautifully made. If you have an idea of what is going on in the inside, if you look at the circuit diagram, and you see how the unknown Roland engineer was making the best out of super limited technology, it's unbelievable.
However, in most foundries, the foundry ladle refers to a steel vessel that has a lifting bail fitted so that the vessel can be carried by an overhead crane or monorail system and is also fitted with a mechanical means for rotating the vessel, usually in the form of a gearbox. The gearbox can either be manually operated or powered operation.
Layout-to-mask preparation that enhances layout data with graphics operations, such as resolution enhancement techniques (RET) – methods for increasing the quality of the final photomask. This also includes optical proximity correction (OPC) or inverse lithography technology (ILT) – the up-front compensation for diffraction and interference ...
The fabless company concentrates on the research and development of an IC-product; the foundry concentrates on manufacturing and testing the physical product. If the foundry does not have any semiconductor design capability, it is a pure-play semiconductor foundry. An absolute separation into fabless and foundry companies is not necessary.