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  2. Piranha solution - Wikipedia

    en.wikipedia.org/wiki/Piranha_solution

    Molecular models of the different molecules active in Piranha solution: peroxysulfuric acid (H 2 SO 5) and hydrogen peroxide (H 2 O 2). Piranha solution, also known as piranha etch, is a mixture of sulfuric acid (H 2 SO 4) and hydrogen peroxide (H 2 O 2). The resulting mixture is used to clean organic residues off substrates, for example ...

  3. RCA clean - Wikipedia

    en.wikipedia.org/wiki/RCA_clean

    The RCA clean is a standard set of wafer cleaning steps which need to be performed before high-temperature processing steps (oxidation, diffusion, CVD) of silicon wafers in semiconductor manufacturing. Werner Kern developed the basic procedure in 1965 while working for RCA, the Radio Corporation of America.

  4. Etching (microfabrication) - Wikipedia

    en.wikipedia.org/wiki/Etching_(microfabrication)

    Etching tanks used to perform Piranha, hydrofluoric acid or RCA clean on 4-inch wafer batches at LAAS technological facility in Toulouse, France. Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module in fabrication, and every wafer ...

  5. Semiconductor device fabrication - Wikipedia

    en.wikipedia.org/wiki/Semiconductor_device...

    Cleaning by solvents such as acetone, trichloroethylene or ultrapure water sometimes while spinning the wafer; Piranha solution; RCA clean; Wafer scrubbing; Spin cleaning [119] Jet spray cleaning [119] Cryogenic aerosol [120] Megasonics [121] Immersion batch cleaning [122] Surface passivation; Photolithography. Photoresist coating (often as a ...

  6. Ultra-high-purity steam for oxidation and annealing - Wikipedia

    en.wikipedia.org/wiki/Ultra-high-purity_steam...

    Oxidation of silicon is a common and frequent step in the manufacture of integrated circuits (IC). The goal of oxidation is to grow a high quality, uniform oxide layer on a silicon substrate. During oxidation, a chemical reaction between the oxidants and the silicon atoms produces a layer of oxide on the silicon surface of the wafer.

  7. Megasonic cleaning - Wikipedia

    en.wikipedia.org/wiki/Megasonic_cleaning

    Megasonic cleaning is a specialized cleaning method that utilizes high-frequency sound waves to remove contaminants from delicate surfaces. It is particularly effective in industries like semiconductor manufacturing , optics , and medical device production, where precision and gentle cleaning are crucial.

  8. Lil Nas X Addresses 'J Christ' Rollout Criticism: 'I Messed ...

    www.aol.com/lil-nas-x-addresses-j-204926577.html

    Lil Nas X is responding to the criticism aimed at the rollout of his recent music video "J Christ," with a sincerity that shines a new light on the 24-year-old.On Monday, the musician took to ...

  9. Silanization of silicon and mica - Wikipedia

    en.wikipedia.org/wiki/Silanization_of_silicon...

    Piranha solution in particular constitutes quite a harsh treatment that can potentially damage the integrity of the silicon surface. Finlayson-Pitts et al. investigated the effect of certain treatments on silicon and concluded that both the roughness (3-5 Å) and the presence of scattered large particles were preserved after 1 cycle of plasma ...