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A process design kit (PDK) is a set of files used within the semiconductor industry to model a fabrication process for the design tools used to design an integrated circuit. The PDK is created by the foundry defining a certain technology variation for their processes.
In semiconductor design, standard-cell methodology is a method of designing application-specific integrated circuits (ASICs) with mostly digital-logic features. Standard-cell methodology is an example of design abstraction, whereby a low-level very-large-scale integration layout is encapsulated into an abstract logic representation (such as a NAND gate).
It is a binary file format representing planar geometric shapes, text labels, and other information about the layout in hierarchical form (two-dimensional/2D CAD file format). The data can be used to reconstruct all or part of the artwork to be used in sharing layouts, transferring artwork between different tools, or creating photomasks .
A Process design kit (PDK) may be provided by the foundry and it may include the standard cell library as well as the specifications of the cells, and tools to verify the fabless company's design against the design rules specified by the foundry as well as simulate it using the foundry's cells. PDKs may be provided under non-disclosure agreements.
Technology files and design rules are essential building blocks of the integrated circuit design process. Their accuracy and robustness over process technology, its variability and the operating conditions of the IC—environmental, parasitic interactions and testing, including adverse conditions such as electro-static discharge—are critical in determining performance, yield and reliability.
In integrated circuit design, Library Exchange Format (LEF) is a specification for representing the physical layout of an integrated circuit in an ASCII format. It includes design rules and abstract information about the standard cells. [1] [2] LEF only has the basic information required at that level to serve the purpose of the concerned CAD ...
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Open Artwork System Interchange Standard (OASIS [3]) is a binary file format used for specification of data structures for photomask production. [4] It's used to represent a pattern an interchange and encapsulation format for hierarchical integrated circuit mask layout information produced during integrated circuit design that is further used for manufacturing of a photomask.