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  2. Negative-bias temperature instability - Wikipedia

    en.wikipedia.org/wiki/Negative-bias_temperature...

    With the introduction of high κ metal gates, a new degradation mechanism has become more important, referred to as PBTI (for positive bias temperature instabilities), which affects nMOS transistor when positively biased. In this case, no interface states are generated and 100% of the Vth degradation may be recovered.

  3. Mask data preparation - Wikipedia

    en.wikipedia.org/wiki/Mask_data_preparation

    Mask data preparation (MDP), also known as layout post processing, is the procedure of translating a file containing the intended set of polygons from an integrated circuit layout into set of instructions that a photomask writer can use to generate a physical mask.

  4. Magic (software) - Wikipedia

    en.wikipedia.org/wiki/Magic_(software)

    VLSI layout of an inverter circuit using Magic software. Magic is an electronic design automation (EDA) layout tool for very-large-scale integration (VLSI) integrated circuit (IC) originally written by John Ousterhout and his graduate students at UC Berkeley. Work began on the project in February 1983.

  5. Caltech Intermediate Form - Wikipedia

    en.wikipedia.org/wiki/Caltech_Intermediate_Form

    Caltech Intermediate Form (CIF) is a file format for describing integrated circuits. CIF provides a limited set of graphics primitives that are useful for describing the two-dimensional shapes on the different layers of a chip. The format allows hierarchical description, which makes the representation concise.

  6. Open Artwork System Interchange Standard - Wikipedia

    en.wikipedia.org/wiki/Open_Artwork_System...

    Open Artwork System Interchange Standard (OASIS [3]) is a binary file format used for specification of data structures for photomask production. [4] It's used to represent a pattern an interchange and encapsulation format for hierarchical integrated circuit mask layout information produced during integrated circuit design that is further used for manufacturing of a photomask.

  7. Intel wins US appeal to overturn $2.18 billion VLSI patent ...

    www.aol.com/news/intel-wins-us-appeal-overturn...

    WASHINGTON (Reuters) -A U.S. appeals court on Monday threw out a $2.18 billion patent-infringement award won by patent owner VLSI Technology against Intel Corp, overturning one of the largest ...

  8. Input/output Buffer Information Specification - Wikipedia

    en.wikipedia.org/wiki/Input/output_Buffer...

    IBIS 3.2 allows for a package model description along with an electrical board description. IBIS Version 5.0 was ratified by the IBIS Open Forum on August 29, 2008. [ 5 ] Compared to the previous version (IBIS 4.2, ANSI/EIA-656-B), it adds a new flow based not on SPICE transient but on a channel simulator (called a lgorithmic m odel application ...

  9. Mead–Conway VLSI chip design revolution - Wikipedia

    en.wikipedia.org/wiki/Mead–Conway_VLSI_chip...

    The Mead–Conway VLSI chip design revolution, or Mead and Conway revolution, was a very-large-scale integration design revolution starting in 1978 which resulted in a worldwide restructuring of academic materials in computer science and electrical engineering education, and was paramount for the development of industries based on the application of microelectronics.