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X-Ray LIGA is a fabrication process in microtechnology that was developed in the early 1980s [1] by a team under the leadership of Erwin Willy Becker and Wolfgang Ehrfeld at the Institute for Nuclear Process Engineering (Institut für Kernverfahrenstechnik, IKVT) at the Karlsruhe Nuclear Research Center, since renamed to the Institute for Microstructure Technology (Institut für ...
X-ray lithography is a process used in semiconductor device fabrication industry to selectively remove parts of a thin film of photoresist. It uses X-rays to transfer a geometric pattern from a mask to a light-sensitive chemical photoresist, or simply "resist," on the substrate to reach extremely small topological size of a feature.
Advanced X-ray Imaging Satellite (AXIS) is a space telescope under development by NASA for launch in 2032. [1] It is a NASA Probe mission concept designed for high angular resolution X-Ray imaging. [2] The mission goals are to examine galaxies over cosmic time, feedback in galaxies, Black Hole strong gravity, Dual AGN, the high redshift universe.
X-ray optics is the branch of optics dealing with X-rays, rather than visible light.It deals with focusing and other ways of manipulating the X-ray beams for research techniques such as X-ray diffraction, X-ray crystallography, X-ray fluorescence, small-angle X-ray scattering, X-ray microscopy, X-ray phase-contrast imaging, and X-ray astronomy.
Recent developments in the design and quality of crystal optics have allowed for some EXAFS measurements to take place in a lab setting, [3] where the tunable x-ray source is achieved via a Rowland circle geometry. While experiments requiring high x-ray flux or specialized sample environments can still only be performed at synchrotron ...
The analysis of the energy dependence of the emitted photons is the aim of the X-ray emission spectroscopy. [1] [2] [3] XES is also sometimes referred to as X-ray Fluorescence (XRF) spectroscopy, and while the terms can be used interchangeably, XES more often describes high energy resolution techniques [4] while XRF studies a wider energy range ...
The device was fabricated using X-ray lithography. [6] Toshiba, Sony and Samsung developed a 90 nm process during 2001–2002, before being introduced in 2002 for Toshiba's eDRAM and Samsung's 2 Gb NAND flash memory. [7] [8] IBM demonstrated a 90 nm silicon-on-insulator (SOI) CMOS process, with development led by Shahidi, in 2002.
With the advancement of image processing software the number applications for automated x-ray inspection is huge and constantly growing. The first applications started off in industries where the safety aspect of components demanded a careful inspection of each part produced (e.g. welding seams for metal parts in nuclear power stations) because the technology was expectedly very expensive in ...