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Fig. 2. The construction of Inductively Coupled Plasma torch. [3] A: cooling gas tangential flow to the outer quartz tube B: discharge gas flow (usually Ar) C: flow of carrier gas with sample D: induction coil which forms the strong magnetic field inside the torch E: force vectors of the magnetic field F: the plasma torch (the discharge).
Hydrogen plasma etching also tends to leave a clean and chemically balanced surface, which is ideal for a number of applications. [5] Oxygen plasma etching can be used for anisotropic deep-etching of diamond nanostructures by application of high bias in inductively coupled plasma/reactive ion etching (ICP/RIE) reactor. [12]
Other types of RIE systems exist, including inductively coupled plasma (ICP) RIE. In this type of system, the plasma is generated with a radio frequency (RF) powered magnetic field. Very high plasma densities can be achieved, though etch profiles tend to be more isotropic. A combination of parallel plate and inductively coupled plasma RIE is ...
Induction plasma, also called inductively coupled plasma, is a type of high temperature plasma generated by electromagnetic induction, usually coupled with argon gas. The magnetic field induces an electric current within the gas which creates the plasma. The plasma can reach temperatures up to 10,000 Kelvin. Inductive plasma technology is used ...
Isotope-ratio mass spectrometry, Multiple collector – inductively coupled plasma – mass spectrometry (MC-ICP-MS) ... Plasma etching; Plasma frequency;
It is a type of emission spectroscopy that uses the inductively coupled plasma to produce excited atoms and ions that emit electromagnetic radiation at wavelengths characteristic of a particular element. [1] The plasma is a high temperature source of ionised source gas (often argon).
A duoplasmatron is a type of glow discharge ion source that consists of a hot cathode or cold cathode that produces a plasma that is used to ionize a gas. [1] [22] THey can produce positive or negative ions. [23] They are used for secondary ion mass spectrometry, ion beam etching, and high-energy physics. [24] [25] [26]
Inductively coupled plasma (ICP): similar to a CCP and with similar applications but the electrode consists of a coil wrapped around the chamber where plasma is formed. [58] Wave heated plasma: similar to CCP and ICP in that it is typically RF (or microwave). Examples include helicon discharge and electron cyclotron resonance (ECR). [59]