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Initially, GDSII was designed as a stream format used to control integrated circuit photomask plotting. Despite its limited set of features and low data density, it became the industry conventional stream format for transfer of IC layout data between design tools of different vendors, all of which operated with proprietary data formats.
[16] [13] SMIC is a major shareholder and supplier to Brite Semiconductor. [17] In response to US sanctions on the Chinese chip industry in the early 2020s, SMIC started on a wave of expansion in the form of joint ventures with China's state semiconductor fund. [18] As of 2024, it is the world's third largest contract chip maker. [19]
Smart cut process. Smart cut is a technological process that enables the transfer of very fine layers of crystalline silicon material onto a mechanical support. It was invented by Michel Bruel of CEA-Leti, and was protected by US patent 5374564. [1]
A number of companies provide secondary semiconductor equipment and/or refurbish semiconductor tools. For example, RED Equipment ($50M+ sales in 2011) provides secondary semiconductor equipment, parts and services including equipment remarketing, de-installation, relocation, refurbishment, and installation.
Open Artwork System Interchange Standard (OASIS [3]) is a binary file format used for specification of data structures for photomask production. [4] It's used to represent a pattern an interchange and encapsulation format for hierarchical integrated circuit mask layout information produced during integrated circuit design that is further used for manufacturing of a photomask.
Mask data preparation (MDP), also known as layout post processing, is the procedure of translating a file containing the intended set of polygons from an integrated circuit layout into set of instructions that a photomask writer can use to generate a physical mask. Typically, amendments and additions to the chip layout are performed in order to ...
A process design kit (PDK) is a set of files used within the semiconductor industry to model a fabrication process for the design tools used to design an integrated circuit. The PDK is created by the foundry defining a certain technology variation for their processes.
Listed are many semiconductor scale examples for various metal–oxide–semiconductor field-effect transistor (MOSFET, or MOS transistor) semiconductor manufacturing process nodes. Timeline of MOSFET demonstrations