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The X-ray standing wave (XSW) technique can be used to study the structure of surfaces and interfaces with high spatial resolution and chemical selectivity. Pioneered by B.W. Batterman in the 1960s, [1] the availability of synchrotron light has stimulated the application of this interferometric technique to a wide range of problems in surface science.
Projective texture mapping is a method of texture mapping that allows a textured image to be projected onto a scene as if by a slide projector. Projective texture mapping is useful in a variety of lighting techniques and it is the starting point for shadow mapping .
Pole figures displaying crystallographic texture of gamma-TiAl in an alpha2-gamma alloy, as measured by high energy X-rays. [1] "Texture" in the context of Materials Science means "crystallographic preferred orientation". If a polycrystalline material (i.e. a material composed of many different crystals or grains, like most metals, ceramics or ...
In computer graphics, relief mapping is a texture mapping technique first introduced in 2000 [1] used to render the surface details of three-dimensional objects accurately and efficiently. [2] It can produce accurate depictions of self-occlusion, self-shadowing, and parallax. [3] It is a form of short-distance ray tracing done in a pixel shader.
X-ray diffraction topography is one variant of X-ray imaging, making use of diffraction contrast rather than absorption contrast which is usually used in radiography and computed tomography (CT). Topography is exploited to a lesser extent with neutrons , and is the same concept as dark field imaging in an electron microscope .
In scientific visualization, texture advection is a family of methods to densely visualize vector fields or flows (like the wind movement of a tornado). Scientists can use the created images and animations to better understand these flows and reason about them.
Polynomial texture mapping (PTM), also known as Reflectance Transformation Imaging (RTI), is a technique of imaging and interactively displaying objects under varying lighting conditions to reveal surface phenomena. The data acquisition method is Single Camera Multi Light (SCML). [1]
X-ray lithography is a process used in semiconductor device fabrication industry to selectively remove parts of a thin film of photoresist. It uses X-rays to transfer a geometric pattern from a mask to a light-sensitive chemical photoresist , or simply "resist," on the substrate to reach extremely small topological size of a feature.