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The chemical interaction between all the different components and the surface of the silicon wafer makes photolithography an interesting chemistry problem. Current engineering has been able to create features on the surface of silicon wafers between 1 and 100 μm .
In deep ultraviolet lithography, chemically amplified resist (CAR) chemistry is used. This resist is much more sensitive to PEB time, temperature, and delay, as the resist works by creating acid when it is hit by photons, and then undergoes an "exposure" reaction (creating acid, making the polymer soluble in the basic developer, and performing ...
Lithography was invented by Alois Senefelder [1] in the Kingdom of Bavaria in 1796. In the early days of lithography, a smooth piece of limestone was used (hence the name "lithography": "lithos" (λιθος) is the Ancient Greek word for "stone"). After the oil-based image was put on the surface, a solution of gum arabic in water was applied ...
LIGA consists of three main processing steps: lithography, electroplating, and molding. There are two main LIGA-fabrication technologies: X-Ray LIGA, which uses X-rays produced by a synchrotron to create high-aspect-ratio structures, and UV LIGA, a more accessible method which uses ultraviolet light to create structures with relatively low aspect ratios.
In lithography, decreasing the wavelength of light source is the most efficient way to achieve higher resolution. [8] Photoresists are most commonly used at wavelengths in the ultraviolet spectrum or shorter (<400 nm). For example, diazonaphthoquinone (DNQ) absorbs strongly from approximately 300 nm to 450 nm. The absorption bands can be ...
Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.
Optical Lithography (or photolithography) is one of the most important and prevalent sets of techniques in the nanolithography field. Optical lithography contains several important derivative techniques, all that use very short light wavelengths in order to change the solubility of certain molecules, causing them to wash away in solution, leaving behind a desired structure.
Dip pen nanolithography (DPN) is a scanning probe lithography technique where an atomic force microscope (AFM) tip is used to directly create patterns on a substrate. [1] It can be done on a range of substances with a variety of inks. A common example of this technique is exemplified by the use of alkane thiolates to imprint onto a gold surface ...