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The generic FLASH technique emerges as a gradient echo sequence which combines a low-flip angle radio-frequency excitation of the NMR signal (recorded as a spatially encoded gradient echo) with a rapid repetition of the basic sequence. The repetition time is usually much shorter than the typical T1 relaxation time of the protons in biologic ...
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In 2010, HardingTest.com was launched to provide users with a way of testing video remotely, without the need to have an in-house Harding FPA machine. This provided a much-needed service for freelance editors and production companies who previously had to export their movie to video tape to send to a larger post-production facility for testing, all of which increased time and expense.
At the Flash Ahead event, IBM emphasized the economic "tipping point" that flash had reached versus traditional storage devices for high-performance applications. [ 14 ] On January 16, 2014, IBM announced the FlashSystem 840 product, which was the first FlashSystem designed entirely by IBM post-acquisition of TMS.
Flash photolysis is a pump-probe laboratory technique, in which a sample is first excited by a strong pulse of light from a pulsed laser of nanosecond, picosecond, or femtosecond pulse width or by another short-pulse light source such as a flash lamp.
The X-500/570 also offered slower flash sync speeds than 1/60 of a second. [ 2 ] [ 3 ] The X-300 also released in 1983 was the most basic model of X-series bodies. It lacked TTL flash metering, program exposure mode and the depth of field preview button, and it did not display the f-stop-setting of the lens in the viewfinder.
The Lumia 640 and 640 XL were unveiled at Microsoft's event at the Mobile World Congress in Barcelona, Spain on March 2, 2015. [7]The Lumia 640 LTE has U.S. pricing beginning at US$ 179.99, while the Lumia 640 XL LTE (exclusive to AT&T in the country) is priced at US$ 249.99.
Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.