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The E-T secondary electron detector can be used in the SEM's back-scattered electron mode by either turning off the Faraday cage or by applying a negative voltage to the Faraday cage. However, better back-scattered electron images come from dedicated BSE detectors rather than from using the E–T detector as a BSE detector.
Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor industry, materials science and increasingly in the biological field for site-specific analysis, deposition, and ablation of materials. A FIB setup is a scientific instrument that resembles a scanning electron microscope (SEM).
The electron beam prober (e-beam prober) is a specialized adaption of a standard scanning electron microscope (SEM) that is used for semiconductor failure analysis.While a conventional SEM may be operated in a voltage range of 10–30 keV, the e-beam Prober typically operates at 1 keV.
A scanning transmission electron microscope (STEM) is a type of transmission electron microscope (TEM). Pronunciation is [stɛm] or [ɛsti:i:ɛm]. As with a conventional transmission electron microscope (CTEM), images are formed by electrons passing through a sufficiently thin specimen. However, unlike CTEM, in STEM the electron beam is focused ...
An account of the early history of scanning electron microscopy has been presented by McMullan. [2] [3] Although Max Knoll produced a photo with a 50 mm object-field-width showing channeling contrast by the use of an electron beam scanner, [4] it was Manfred von Ardenne who in 1937 invented [5] a microscope with high resolution by scanning a very small raster with a demagnified and finely ...
Electron-beam-induced current (EBIC) is a semiconductor analysis technique performed in a scanning electron microscope (SEM) or scanning transmission electron microscope (STEM). It is most commonly used to identify buried junctions or defects in semiconductors, or to examine minority carrier properties.
MEMS microcantilever resonating inside a scanning electron microscope Proposal submitted to DARPA in 1986 first introducing the term "microelectromechanical systems". MEMS (micro-electromechanical systems) is the technology of microscopic devices incorporating both electronic and moving parts.
FEI Company (Field Electron and Ion Company) was an American company that designed, manufactured, and supported microscope technology. Headquartered in Hillsboro, Oregon , FEI had over 2,800 employees and sales and service operations in more than 50 countries around the world.