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The dominant application of tungsten fluoride is in semiconductor industry, where it is widely used for depositing tungsten metal in a chemical vapor deposition (CVD) process. The expansion of the industry in the 1980s and 1990s resulted in the increase of WF 6 consumption, which remains at around 200 tonnes per year worldwide.
Some metal hexafluorides find applications due to their volatility. Uranium hexafluoride is used in the uranium enrichment process to produce fuel for nuclear reactors. Fluoride volatility can also be exploited for nuclear fuel reprocessing. Tungsten hexafluoride is used in the production of semiconductors through the process of chemical vapor ...
Tungsten hexafluoride (tungsten(VI) fluoride) This page was last edited on 18 July 2023, at ...
Tungsten CVD, used for forming conductive contacts, vias, and plugs on a semiconductor device, [19] is achieved from tungsten hexafluoride (WF 6), which may be deposited in two ways: WF 6 → W + 3 F 2 WF 6 + 3 H 2 → W + 6 HF. Other metals, notably aluminium and copper, can be deposited by CVD.
Tungsten disilicide layers can be prepared by chemical vapor deposition, e.g. using monosilane or dichlorosilane with tungsten hexafluoride as source gases. The deposited film is non-stoichiometric, and requires annealing to convert to more conductive stoichiometric form. Tungsten disilicide is a replacement for earlier tungsten films. [2]
The metals that make well-characterized hexafluorides include nine metals in the center of the periodic table (molybdenum, technetium, ruthenium, rhodium, tungsten, rhenium, osmium, iridium, and platinum) along with elements 92–94: uranium, neptunium, and plutonium. At room temperature, tungsten hexafluoride is a gas.
Tungsten hexafluoride is not a gas at standard conditions. STP for gases is defined as 0° C and 1 atm. The standard boiling point of this compound is listed as 17.1° C. It is a gas at room temperature, but not at standard temperature. 144.162.23.122 22:27, 24 September 2013 (UTC) Good point.
Tungsten tetrafluoride is an inorganic compound with the formula WF 4. This little studied solid has been invoked, together with tungsten pentafluoride , as an intermediate in the chemical vapor deposition of tungsten films using tungsten hexafluoride .