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  2. RCA clean - Wikipedia

    en.wikipedia.org/wiki/RCA_clean

    The RCA clean is a standard set of wafer cleaning steps which need to be performed before high-temperature processing steps (oxidation, diffusion, CVD) of silicon wafers in semiconductor manufacturing. Werner Kern developed the basic procedure in 1965 while working for RCA, the Radio Corporation of America.

  3. Etching (microfabrication) - Wikipedia

    en.wikipedia.org/wiki/Etching_(microfabrication)

    Etching is a critically important process module in fabrication, and every wafer undergoes many etching steps before it is complete. For many etch steps, part of the wafer is protected from the etchant by a "masking" material which resists etching. In some cases, the masking material is a photoresist which has been patterned using photolithography.

  4. Semiconductor device fabrication - Wikipedia

    en.wikipedia.org/wiki/Semiconductor_device...

    For example, in conventional lithography, the wafer is coated with a chemical called a photoresist; then, a machine called an aligner or stepper focuses a mask image on the wafer using short-wavelength light; the exposed regions (for "positive" resist) are washed away by a developer solution. The wafer then undergoes etching where materials not ...

  5. Microfabrication - Wikipedia

    en.wikipedia.org/wiki/Microfabrication

    a wide variety of other processes for cleaning, planarizing, or modifying the chemical properties of microfabricated devices can also be performed. Some examples include: Doping by either thermal diffusion or ion implantation; Chemical-mechanical planarization (CMP) Wafer cleaning, also known as "surface preparation" (see below) Wire bonding

  6. ACM Research - Wikipedia

    en.wikipedia.org/wiki/ACM_Research

    ACM Research, Inc. (ACMR) is a publicly traded American semiconductor company that engages in the manufacture and sale of single-wafer wet cleaning equipment used to improve product yield. Although based in the U.S., the majority of the company's business is done in China through its subsidiary, ACM Research (Shanghai).

  7. Reactive-ion etching - Wikipedia

    en.wikipedia.org/wiki/Reactive-ion_etching

    The wafer platter is electrically isolated from the rest of the chamber. Gas enters through small inlets in the top of the chamber, and exits to the vacuum pump system through the bottom. The types and amount of gas used vary depending upon the etch process; for instance, sulfur hexafluoride is commonly used for etching silicon .

  8. Wafer fabrication - Wikipedia

    en.wikipedia.org/wiki/Wafer_fabrication

    Wafer fabrication is a procedure composed of many repeated sequential processes to produce complete electrical or photonic circuits on semiconductor wafers in a semiconductor device fabrication process. Examples include production of radio frequency amplifiers, LEDs, optical computer components, and microprocessors for computers. Wafer ...

  9. wafer-to-wafer (also wafer-on-wafer) stacking – bonding and integrating whole processed wafers atop one another before dicing the stack into dies wire bonding – using tiny wires to interconnect an IC or other semiconductor device with its package (see also thermocompression bonding, flip chip, hybrid bonding, etc.)

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