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  2. Epitaxy - Wikipedia

    en.wikipedia.org/wiki/Epitaxy

    The relative orientation(s) of the epitaxial layer to the seed layer is defined in terms of the orientation of the crystal lattice of each material. For most epitaxial growths, the new layer is usually crystalline and each crystallographic domain of the overlayer must have a well-defined orientation relative to the substrate crystal structure.

  3. Lateral epitaxial overgrowth and pendeo-epitaxy - Wikipedia

    en.wikipedia.org/wiki/Lateral_epitaxial...

    Having device layers of low defect density enables improved device characteristics and performance [18] [19] Fig.1 A schematic diagram of the lateral epitaxial overgrowth (LEO) of GaN.The LEO film grows simultaneously from the GaN windows both vertically and at the same time extends laterally over the mask, forming wings of much lower density ...

  4. Molecular-beam epitaxy - Wikipedia

    en.wikipedia.org/wiki/Molecular-beam_epitaxy

    Molecular-beam epitaxy takes place in high vacuum or ultra-high vacuum (10 −8 –10 −12 Torr).The most important aspect of an MBE process is the deposition rate (typically less than 3,000 nm per hour) that allows the films to grow epitaxially (in layers on top of the existing crystal).

  5. Epitaxial wafer - Wikipedia

    en.wikipedia.org/wiki/Epitaxial_wafer

    Solar cells, or photovoltaic cells (PV) for producing electric power from sunlight can be grown as thick epi wafers on a monocrystalline silicon "seed" wafer by chemical vapor deposition (CVD), and then detached as self-supporting wafers of some standard thickness (e.g., 250 μm) that can be manipulated by hand, and directly substituted for wafer cells cut from monocrystalline silicon ingots.

  6. Selective area epitaxy - Wikipedia

    en.wikipedia.org/wiki/Selective_area_epitaxy

    Selective area epitaxy is the local growth of epitaxial layer through a patterned amorphous dielectric mask (typically SiO 2 or Si 3 N 4) deposited on a semiconductor substrate. . Semiconductor growth conditions are selected to ensure epitaxial growth on the exposed substrate, but not on the dielectric mask

  7. Vertical-cavity surface-emitting laser - Wikipedia

    en.wikipedia.org/wiki/Vertical-cavity_surface...

    Diagram of a simple VCSEL structure. The vertical-cavity surface-emitting laser (VCSEL / ˈ v ɪ k s əl /) is a type of semiconductor laser diode with laser beam emission perpendicular from the top surface, contrary to conventional edge-emitting semiconductor lasers (also called in-plane lasers) which emit from surfaces formed by cleaving the individual chip out of a wafer.

  8. Interband cascade laser - Wikipedia

    en.wikipedia.org/wiki/Interband_cascade_laser

    The entire epitaxial structure consists of several cascade stages that are sandwiched between two separate confinement layers (SCLs), with other materials enclosing the SCLs to provide optical cladding. In addition to producing light, the layered epitaxial structure must also act as a waveguide so that the cascade stages amplify guided optical ...

  9. Discovery of graphene - Wikipedia

    en.wikipedia.org/wiki/Discovery_of_graphene

    This "epitaxial graphene" consists of a single-atom-thick hexagonal lattice of sp 2-bonded carbon atoms, as in free-standing graphene. However, significant charge transfers from the substrate to the epitaxial graphene, and in some cases, the d-orbitals of the substrate atoms hybridize with the π orbitals of graphene, which significantly alters ...