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A portion of the disclosure of this patent document contains material which is subject to (copyright or mask work) protection. The (copyright or mask work) owner has no objection to the facsimile reproduction by anyone of the patent document or the patent disclosure, as it appears in the Patent and Trademark Office patent file or records, but ...
This output should be enclosed within reference tags (<ref> and </ref>) in the same way as Template:Cite journal. Note that patent application numbers are generally different from patent numbers. If you need this, please use the Template:Cite patent template with the optional application parameter. Examples: {{patent|US|6556992}} results in; US ...
A patent applicant may include a copyright notice or mask work notice, but only if it also includes the following authorization, expressly permitting the reproduction of the patent: [9] A portion of the disclosure of this patent document contains material which is subject to (copyright or mask work) protection.
From "Template:Cite patent/doc": "Simple patent template for citing patents or patent applications from any country in the esp@cenet database. This database is more useful than the USPTO database since it highlights related patents/applications in other countries, provides current status information, and is available in three languages.
Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts.
{{Cite patent}}, creates links to US and other patents on the espacenet database {{Citeref patent}}, for an inline citations to a patent bibliography {{EPO Register}}, to include a link to the European Patent Register entry of a European patent or patent application {}, a generic template for general use referring to world's patent offices
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