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186 etched glass at Bankfield Museum. Glass etching, or "French embossing", is a popular technique developed during the mid-1800s that is still widely used in both residential and commercial spaces today. Glass etching comprises the techniques of creating art on the surface of glass by applying acidic, caustic, or abrasive substances.
Buffered oxide etch (BOE), also known as buffered HF or BHF, is a wet etchant used in microfabrication. It is a mixture of a buffering agent, such as ammonium fluoride NH 4 F, and hydrofluoric acid (HF). Its primary use is in etching thin films of silicon nitride (Si 3 N 4) or silicon dioxide (SiO 2), by the reaction: SiO 2 + 4HF + 2NH 4 F → ...
Hydrofluoric acid [2] is most often used to etch glass in a special marker equipped with a tip formed by a bed with a round footprint that runs down a vertical surface. The flow intensity can be influenced by pressing the marker. After applying the liquid to the glass surface, a permanent impression is formed, which cannot be removed by cleaning.
Although hydrofluoric acid is regarded as a weak acid, it is very corrosive, even attacking glass when hydrated. [ 20 ] Dilute solutions are weakly acidic with an acid ionization constant K a = 6.6 × 10 −4 (or p K a = 3.18 ), [ 10 ] in contrast to corresponding solutions of the other hydrogen halides, which are strong acids ( p K a < 0 ).
Toxic hydrofluoric acid was also used to mark glass tubes used in science laboratories. For fluorine etching, however, as first described in 1912 by Hieronim Wilder , a normal glass plate was coated with colophony (a solid resin obtained from certain types of conifers), followed by the artist etching a design into it, which was then treated ...
This substance is commonly called "commercial ammonium fluoride". The word "neutral" is sometimes added to "ammonium fluoride" to represent the neutral salt [NH 4]F as opposed to the "acid salt" (NH 4 HF 2). The acid salt is usually used in preference to the neutral salt in the etching of glass and related silicates. This property is shared ...
Etching tanks used to perform Piranha, hydrofluoric acid or RCA clean on 4-inch wafer batches at LAAS technological facility in Toulouse, France. Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing.
Hydrogen fluoride is typically produced by the reaction between sulfuric acid and pure grades of the mineral fluorite: [14] CaF 2 + H 2 SO 4 → 2 HF + CaSO 4. About 20% of manufactured HF is a byproduct of fertilizer production, which generates hexafluorosilicic acid. This acid can be degraded to release HF thermally and by hydrolysis: H 2 SiF ...