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  2. Integrated circuit layout - Wikipedia

    en.wikipedia.org/wiki/Integrated_circuit_layout

    Layout view of a simple CMOS operational amplifier. In integrated circuit design, integrated circuit (IC) layout, also known IC mask layout or mask design, is the representation of an integrated circuit in terms of planar geometric shapes which correspond to the patterns of metal, oxide, or semiconductor layers that make up the components of the integrated circuit.

  3. Integrated circuit design - Wikipedia

    en.wikipedia.org/wiki/Integrated_circuit_design

    Digital design focuses on logical correctness, maximizing circuit density, and placing circuits so that clock and timing signals are routed efficiently. Analog IC design also has specializations in power IC design and RF IC design. Analog IC design is used in the design of op-amps, linear regulators, phase locked loops, oscillators and active ...

  4. Integrated circuit layout design protection - Wikipedia

    en.wikipedia.org/wiki/Integrated_circuit_layout...

    Australian law refers to mask works as "eligible layouts" or ELs. [2] In Canada these rights are protected under the [Integrated Circuit Topography Act (1990, c. 37)]. In the European Union, a sui generis design right protecting the design of materials was introduced by the Directive 87/54/EEC which is transposed in all member states.

  5. Open Artwork System Interchange Standard - Wikipedia

    en.wikipedia.org/wiki/Open_Artwork_System...

    Open Artwork System Interchange Standard (OASIS [3]) is a binary file format used for specification of data structures for photomask production. [4] It's used to represent a pattern an interchange and encapsulation format for hierarchical integrated circuit mask layout information produced during integrated circuit design that is further used for manufacturing of a photomask.

  6. Physical design (electronics) - Wikipedia

    en.wikipedia.org/wiki/Physical_design_(electronics)

    In integrated circuit design, physical design is a step in the standard design cycle which follows after the circuit design.At this step, circuit representations of the components (devices and interconnects) of the design are converted into geometric representations of shapes which, when manufactured in the corresponding layers of materials, will ensure the required functioning of the components.

  7. Photomask - Wikipedia

    en.wikipedia.org/wiki/Photomask

    The costs of creating new mask shop for 180 nm processes were estimated in 2005 as $40 million, and for 130 nm - more than $100 million. [26] The purchase price of a photomask, in 2006, could range from $250 to $100,000 [27] for a single high-end phase-shift mask. As many as 30 masks (of varying price) may be required to form a complete mask set.