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Chemical mechanical polishing (CMP) (also called chemical mechanical planarization) is a process of smoothing surfaces with the combination of chemical and mechanical forces. It can be thought of as a hybrid of chemical etching and free abrasive polishing. [ 1 ]
Meat slurry, a mixture of finely ground meat and water, centrifugally dewatered and used as a food ingredient. An abrasive substance used in chemical-mechanical polishing; Slurry ice, a mixture of ice crystals, freezing point depressant, and water; A mixture of raw materials and water involved in the rawmill manufacture of Portland cement
In this machine, a small slurry pump can be seen at the side, this pump feeds abrasive slurry onto the rotating lapping plate. Logitech lapping machine and retention jig When there is a requirement to lap very small specimens (from 75 mm (3 in) down to a few millimetres), a lapping jig can be used to hold the material while it is lapped (see ...
The principal industrial application of ceria is for polishing, especially chemical-mechanical planarization (CMP). [3] For this purpose, it has displaced many other oxides that were previously used, such as iron oxide and zirconia. For hobbyists, it is also known as "opticians' rouge". [20] [21]
The tool travels vertically or orthogonal to the surface of the part at amplitudes of 0.05 to 0.125 mm (0.002 to 0.005 in.). [1] The fine abrasive grains are mixed with water to form a slurry that is distributed across the part and the tip of the tool. Typical grain sizes of the abrasive material range from 100 to 1000, where smaller grains ...
Optical surfaces are polished in a computer-controlled magnetorheological (MR) finishing slurry. Unlike conventional rigid lap polishing, the MR fluid's shape and stiffness can be magnetically manipulated and controlled in real time. The optic's final surface form and finishing results are predicted through the use of computer algorithms.