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The root words photo, litho, and graphy all have Greek origins, with the meanings 'light', 'stone' and 'writing' respectively. As suggested by the name compounded from them, photolithography is a printing method (originally based on the use of limestone printing plates) in which light plays an essential role.
An example of Electron beam lithograph setup. Electron-beam lithography (often abbreviated as e-beam lithography or EBL) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing). [1]
For example, a beam of red photons, entangled 50 at a time in the NOON state, would have the same resolving power as a beam of x-ray photons. The field of quantum lithography is in its infancy, and although experimental proofs of principle have been carried out using the Hong–Ou–Mandel effect, [3] it is considered promising technology.
Contact lithography, also known as contact printing, is a form of photolithography whereby the image to be printed is obtained by illumination of a photomask in direct contact with a substrate coated with an imaging photoresist layer.
For example, proximity effect correction in electron beam lithography is included as an automated capability on commercial electron-beam lithography tools. Since many non-lithographic processes exhibit their own proximity effects, e.g., chemical-mechanical polishing or plasma etching , these effects can be mixed in with the original OPC.
The chemical interaction between all the different components and the surface of the silicon wafer makes photolithography an interesting chemistry problem. Current engineering has been able to create features on the surface of silicon wafers between 1 and 100 μm .
In semiconductor device fabrication, the inverse lithography technology (ILT) is an approach to photomask design. It is basically an approach to solve an inverse imaging problem : to calculate the shapes of the openings in a photomask ("source") so that the passing light produces a good approximation of the desired pattern ("target") on the ...
Quantum lithography is a type of quantum imaging that focuses on aspects of photons to surpass the limits of classical lithography. Using entangled light, the effective resolution becomes a factor of N lesser than the Rayleigh limit of Δ x = λ 2 {\displaystyle \Delta x={\frac {\lambda }{2}}} . [ 12 ]