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  2. Etching - Wikipedia

    en.wikipedia.org/wiki/Etching

    However, from 1880 to 1950 a photo-mechanical ("line-block") variant was the dominant form of commercial printing for images. A similar process to etching, but printed as a relief print, so it is the "white" background areas which are exposed to the acid, and the areas to print "black" which are covered with ground. Blake's exact technique ...

  3. Etching (microfabrication) - Wikipedia

    en.wikipedia.org/wiki/Etching_(microfabrication)

    Etching is a critically important process module in fabrication, and every wafer undergoes many etching steps before it is complete. For many etch steps, part of the wafer is protected from the etchant by a "masking" material which resists etching. In some cases, the masking material is a photoresist which has been patterned using photolithography.

  4. Chemical milling - Wikipedia

    en.wikipedia.org/wiki/Chemical_milling

    Chemical milling or industrial etching is the subtractive manufacturing process of using baths of temperature-regulated etching chemicals to remove material to create an object with the desired shape. [1] [2] Other names for chemical etching include photo etching, chemical etching, photo chemical etching and photochemical machining. It is ...

  5. Plasma etching - Wikipedia

    en.wikipedia.org/wiki/Plasma_etching

    The dry etch is then performed so that structured etching is achieved. After the process, the remaining photoresist has to be removed. This is also done in a special plasma etcher, called an asher. [14] Dry etching allows a reproducible, uniform etching of all materials used in silicon and III-V semiconductor technology. By using inductively ...

  6. Dry etching - Wikipedia

    en.wikipedia.org/wiki/Dry_etching

    Dry etching refers to the removal of material, typically a masked pattern of semiconductor material, by exposing the material to a bombardment of ions (usually a plasma of reactive gases such as fluorocarbons, oxygen, chlorine, boron trichloride; sometimes with addition of nitrogen, argon, helium and other gases) that dislodge portions of the material from the exposed surface.

  7. Reactive-ion etching - Wikipedia

    en.wikipedia.org/wiki/Reactive-ion_etching

    Reactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching . RIE uses chemically reactive plasma to remove material deposited on wafers .

  8. Photochemical machining - Wikipedia

    en.wikipedia.org/wiki/Photochemical_machining

    Photochemical etching (center), compared to reactive ion etching (bottom) Photochemical machining (PCM), also known as photochemical milling or photo etching, is a chemical milling process used to fabricate sheet metal components using a photoresist and etchants to corrosively machine away selected areas. This process emerged in the 1960s as an ...

  9. Intaglio (printmaking) - Wikipedia

    en.wikipedia.org/wiki/Intaglio_(printmaking)

    In intaglio printing, the lines to be printed are cut into a metal (e.g. copper) plate by means either of a cutting tool called a burin, held in the hand – in which case the process is called engraving; or through the corrosive action of acid – in which case the process is known as etching. [6] [7]