When.com Web Search

Search results

  1. Results From The WOW.Com Content Network
  2. List of MOSFET applications - Wikipedia

    en.wikipedia.org/wiki/List_of_MOSFET_applications

    MOSFET, showing gate (G), body (B), source (S), and drain (D) terminals. The gate is separated from the body by an insulating layer (pink).. The MOSFET (metal–oxide–semiconductor field-effect transistor) [1] is a type of insulated-gate field-effect transistor (IGFET) that is fabricated by the controlled oxidation of a semiconductor, typically silicon.

  3. List of 7400-series integrated circuits - Wikipedia

    en.wikipedia.org/wiki/List_of_7400-series...

    quad 2-input NOR gate open-collector driver N O =30 14 SN74LS33: 74x34 6 hex buffer gate 14 MM74HC34: 74x35 6 hex buffer gate open-collector 14 SN74ALS35: 74x36 4 quad 2-input NOR gate (different pinout than 7402) 14 SN74HC36: 74x37 4 quad 2-input NAND gate driver N O =30 14 SN74LS37: 74x38 4 quad 2-input NAND gate open-collector driver N O =30 ...

  4. List of semiconductor scale examples - Wikipedia

    en.wikipedia.org/wiki/List_of_semiconductor...

    1.2 CMOS (single-gate) 1.3 Multi-gate MOSFET ... a programmable sound generator developed for the Commodore 64 in ... [128] with Zen 2-based CPUs and APUs from July ...

  5. List of 4000-series integrated circuits - Wikipedia

    en.wikipedia.org/wiki/List_of_4000-series...

    The following is a list of CMOS 4000-series digital logic integrated circuits.In 1968, the original 4000-series was introduced by RCA.Although more recent parts are considerably faster, the 4000 devices operate over a wide power supply range (3V to 18V recommended range for "B" series) and are well suited to unregulated battery powered applications and interfacing with sensitive analogue ...

  6. 2 nm process - Wikipedia

    en.wikipedia.org/wiki/2_nm_process

    In semiconductor manufacturing, the 2 nm process is the next MOSFET (metal–oxide–semiconductor field-effect transistor) die shrink after the 3 nm process node.. The term "2 nanometer", or alternatively "20 angstrom" (a term used by Intel), has no relation to any actual physical feature (such as gate length, metal pitch or gate pitch) of the transistors.

  7. Field-effect transistor - Wikipedia

    en.wikipedia.org/wiki/Field-effect_transistor

    Typically the width is much larger than the length of the gate. A gate length of 1 μm limits the upper frequency to about 5 GHz, 0.2 μm to about 30 GHz. The names of the terminals refer to their functions. The gate terminal may be thought of as controlling the opening and closing of a physical gate.

  8. Self-aligned gate - Wikipedia

    en.wikipedia.org/wiki/Self-aligned_gate

    The first memory chip to use silicon-gate technology was the Intel 1101 SRAM (static random-access memory) chip, fabricated in 1968 and demonstrated in 1969. [5] The first commercial single-chip microprocessor, the Intel 4004, was developed by Faggin using his silicon-gate MOS IC technology.

  9. Multigate device - Wikipedia

    en.wikipedia.org/wiki/Multigate_device

    FlexFET is a planar, independently double-gated transistor with a damascene metal top gate MOSFET and an implanted JFET bottom gate that are self-aligned in a gate trench. . This device is highly scalable due to its sub-lithographic channel length; non-implanted ultra-shallow source and drain extensions; non-epi raised source and drain regions; and gate-last fl