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Acetyl hypochlorite is reported to be produced by the reaction of acetic anhydride and dichlorine monoxide at very low temperatures: [2]. Cl 2 O + (CH3CO) 2 O → 2CH 3 COOCl. The liquid can be distilled at reduced pressure, however it cannot be heated, as it violently decomposes at 100 °C to acetic anhydride, oxygen, and chlorine gas, and reacts with water and alcohols.
Industrially, it is produced by the reaction of ethylene oxide, hydrogen chloride, and trimethylamine, [4] or from the pre-formed salt: [5] Choline chloride can also be made by treating trimethylamine with 2-chloroethanol. [6] (CH 3) 3 N + ClCH 2 CH 2 OH → [(CH 3) 3 NCH 2 CH 2 OH] + Cl −
He assumed that in the reaction of two molecules not only the end product of the reaction can be formed, but also unstable, reactive intermediates which can continue the chain reaction. [3] Photochlorination garnered commercial attention with the availability of cheap chlorine from chloralkali electrolysis. [4]
The industrial-scale synthesis for sodium chlorate starts from an aqueous sodium chloride solution (brine) rather than chlorine gas. If the electrolysis equipment allows for the mixing of the chlorine and the sodium hydroxide , then the disproportionation reaction described above occurs.
Benzyl chloride is prepared industrially by the gas-phase photochemical reaction of toluene with chlorine: [3] C 6 H 5 CH 3 + Cl 2 → C 6 H 5 CH 2 Cl + HCl. In this way, approximately 100,000 tonnes are produced annually. The reaction proceeds by the free radical process, involving the intermediacy of free chlorine atoms. [4]
Chlorine is a respiratory irritant that attacks mucous membranes and burns the skin. As little as 3.53 ppm can be detected as an odor, and 1000 ppm is likely to be fatal after a few deep breaths. Exposure to chlorine has been limited to 0.5 ppm (8-hour time-weighted average—38-hour week) by the U.S. OSHA. [9]
In inorganic chemistry, chlorosilanes are a group of reactive, chlorine-containing chemical compounds, related to silane (SiH 4) and used in many chemical processes. Each such chemical has at least one silicon-chlorine (Si−Cl) bond. Trichlorosilane is produced on the largest scale. The parent chlorosilane is silicon tetrachloride (SiCl 4). [1]
Chloroprene should be stored in closed containers in a cool, well-ventilated area with the temperature no higher than 50 °F (10 °C). In addition, chloroprene has a high reactivity and should be stored away from oxidizing agents such as perchlorate, peroxides, permanganates, chlorates, nitrates, chlorine, bromine, and fluorine.