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  2. Inductively coupled plasma mass spectrometry - Wikipedia

    en.wikipedia.org/wiki/Inductively_coupled_plasma...

    New and reduced maximum permitted exposure levels of heavy metals from dietary supplements, introduced in USP (United States Pharmacopeia) «〈232〉Elemental Impurities—Limits» [4] and USP «〈232〉Elemental Impurities—Procedures», [5] will increase the need for ICP-MS technology, where, previously, other analytic methods have been ...

  3. Inductively coupled plasma atomic emission spectroscopy

    en.wikipedia.org/wiki/Inductively_coupled_plasma...

    Examples of the application of ICP-AES include the determination of metals in wine, [7] arsenic in food, [8] and trace elements bound to proteins. [9] ICP-AES methods are used to test for metals contamination in drinking water and wastewater. [10]

  4. Parts cleaning - Wikipedia

    en.wikipedia.org/wiki/Parts_cleaning

    For the activities described here, the following terms are often found: metal cleaning, metal surface cleaning, component cleaning, degreasing, parts washing, and parts cleaning. These are well established in technical language usage, but they have their shortcomings. Metal cleaning can easily be mixed up with the refinement of un-purified metals.

  5. Metallurgical assay - Wikipedia

    en.wikipedia.org/wiki/Metallurgical_assay

    Only bullion methods validated and traceable to accepted international standards obtain genuine accuracies of 1 part in 10,000. Cupellation alone can only remove a limited quantity of impurities from a sample. Fire assay, as applied to ores, concentrates, or less pure metals, adds a fusion or scorification step before cupellation.

  6. Reactive-ion etching - Wikipedia

    en.wikipedia.org/wiki/Reactive-ion_etching

    A combination of parallel plate and inductively coupled plasma RIE is possible. In this system, the ICP is employed as a high density source of ions which increases the etch rate, whereas a separate RF bias is applied to the substrate (silicon wafer) to create directional electric fields near the substrate to achieve more anisotropic etch ...

  7. Vapour phase decomposition - Wikipedia

    en.wikipedia.org/wiki/Vapour_phase_decomposition

    The method has yielded good results for the detection and measurement of nickel and iron. To improve the range of elemental impurities and lower detection limits, the acid droplets obtained from the silicon wafers are analyzed by ICP-MS (Inductively coupled plasma mass spectrometry). This technique, VPD ICP-MS provides accurate measurement of ...

  8. Chelation therapy - Wikipedia

    en.wikipedia.org/wiki/Chelation_therapy

    Chelation therapy is a medical procedure that involves the administration of chelating agents to remove heavy metals from the body. [1] Chelation therapy has a long history of use in clinical toxicology [2] and remains in use for some very specific medical treatments, although it is administered under very careful medical supervision due to various inherent risks, including the mobilization of ...

  9. Contaminants of emerging concern - Wikipedia

    en.wikipedia.org/wiki/Contaminants_of_emerging...

    Metals and metalloids are typically analyzed using techniques like inductively coupled plasma mass spectrometry (ICP-MS), which allows for the simultaneous analysis of multiple elements USGS. The complications with monitoring CEC go past just detection. Their pathways across different environmental also must be monitored.