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  2. Deposition (chemistry) - Wikipedia

    en.wikipedia.org/wiki/Deposition_(chemistry)

    In chemistry, deposition occurs when molecules settle out of a solution. Deposition can be defined as the process of direct transition of a substance from its gaseous form, on cooling, into a solid state without passing through the intermediate liquid state. [1] Deposition can be viewed as a reverse process to dissolution or particle re ...

  3. Deposition (phase transition) - Wikipedia

    en.wikipedia.org/wiki/Deposition_(phase_transition)

    Deposition is the phase transition in which gas transforms into solid without passing through the liquid phase. Deposition is a thermodynamic process . The reverse of deposition is sublimation and hence sometimes deposition is called desublimation .

  4. Atomic layer deposition - Wikipedia

    en.wikipedia.org/wiki/Atomic_layer_deposition

    Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition. The majority of ALD reactions use two chemicals called precursors (also called "reactants").

  5. Chemical decomposition - Wikipedia

    en.wikipedia.org/wiki/Chemical_decomposition

    The following equation is an example, where M represents the given metal: MCO 3 → MO + CO 2. A specific example is that involving calcium carbonate: CaCO 3 → CaO + CO 2. Metal chlorates also decompose when heated. In this type of decomposition reaction, a metal chloride and oxygen gas are the products. Here, again, M represents the metal:

  6. Lever rule - Wikipedia

    en.wikipedia.org/wiki/Lever_rule

    In chemistry, the lever rule is a formula used to determine the mole fraction (x i) or the mass fraction (w i) of each phase of a binary equilibrium phase diagram.It can be used to determine the fraction of liquid and solid phases for a given binary composition and temperature that is between the liquidus and solidus line.

  7. Chemical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Chemical_vapor_deposition

    Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films .

  8. Clausius–Clapeyron relation - Wikipedia

    en.wikipedia.org/wiki/Clausius–Clapeyron_relation

    Substituting into the Clapeyron equation =, we can obtain the Clausius–Clapeyron equation [8]: 509 = for low temperatures and pressures, [8]: 509 where is the specific latent heat of the substance. Instead of the specific, corresponding molar values (i.e. L {\\displaystyle L} in kJ/mol and R = 8.31 J/(mol⋅K)) may also be used.

  9. Particle deposition - Wikipedia

    en.wikipedia.org/wiki/Particle_deposition

    Particle deposition is the spontaneous attachment of particles to surfaces. The particles in question are normally colloidal particles , while the surfaces involved may be planar, curved, or may represent particles much larger in size than the depositing ones (e.g., sand grains).

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    atomic layer deposition techniquesatomic layer deposition