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  2. Microlens - Wikipedia

    en.wikipedia.org/wiki/Microlens

    A microlens array used in a spectrograph. A microlens is a small lens, generally with a diameter less than a millimetre (mm) and often as small as 10 micrometres (μm). The small sizes of the lenses means that a simple design can give good optical quality but sometimes unwanted effects arise due to optical diffraction at the small features.

  3. Immersion lithography - Wikipedia

    en.wikipedia.org/wiki/Immersion_lithography

    In immersion lithography, light travels down through a system of lenses and then a pool of water before reaching the photoresist on top of the wafer.. Immersion lithography is a technique used in semiconductor manufacturing to enhance the resolution and accuracy of the lithographic process.

  4. Chemistry of photolithography - Wikipedia

    en.wikipedia.org/wiki/Chemistry_of_photolithography

    The wafer can undergo a dehydration bake to remove adsorbed water, and followed by the HMDS treatment also known as the priming stage. HMDS can be dispensed in liquid form onto the wafer using a syringe while the wafer is attached to a vacuum chuck in a spin coater. HMDS can also be applied in gas form in the process known as the vapor prime.

  5. Photolithography - Wikipedia

    en.wikipedia.org/wiki/Photolithography

    The root words photo, litho, and graphy all have Greek origins, with the meanings 'light', 'stone' and 'writing' respectively. As suggested by the name compounded from them, photolithography is a printing method (originally based on the use of limestone printing plates) in which light plays an essential role.

  6. Wafer Level Optics - Wikipedia

    en.wikipedia.org/?title=Wafer_Level_Optics&...

    Microlens#Wafer-level optics To a section : This is a redirect from a topic that does not have its own page to a section of a page on the subject. For redirects to embedded anchors on a page, use {{ R to anchor }} instead .

  7. Ultra-high-purity steam for oxidation and annealing - Wikipedia

    en.wikipedia.org/wiki/Ultra-high-purity_steam...

    Immersion lithography places a layer of pure water between the projection lens and the wafer. Any contaminant within the water can lead to change in refractive index and a project defect on the wafer. Micro-bubbles in the water can also lead to project defects on the wafer. Water vapor also plays an important role in Carbon NanoTube (CNT ...