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A photomask (also simply called a mask) is an opaque plate with transparent areas that allow light to shine through in a defined pattern. Photomasks are commonly used in photolithography for the production of integrated circuits (ICs or "chips") to produce a pattern on a thin wafer of material (usually silicon ).
A face with a point hole is considered a monogonal hole, adding one vertex, and one edge, and can attached to a degenerate monogonal hosohedron hole, like a cylinder hole with zero radius. A face with a degenerate digon hole adds 2 vertices and 2 coinciding edges, where the two edges attach to two coplanar faces, as a dihedron hole.
Early algorithms for Boolean operations on polygons were based on the use of bitmaps.Using bitmaps in modeling polygon shapes has many drawbacks. One of the drawbacks is that the memory usage can be very large, since the resolution of polygons is proportional to the number of bits used to represent polygons.
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The line cut shapes themselves are subject to rounding; this rounding can be minimized with optimized illumination, [45] but cannot be eliminated completely. When applying the second mask to cut lines, the overlay relative to the first mask needs to be considered; otherwise, edge placement errors (EPE) may result.
The rule can be seen in effect in many vector graphic programs (such as Freehand or Illustrator), where a crossing of an outline with itself causes shapes to fill in strange ways. On a simple curve, the even–odd rule reduces to a decision algorithm for the point in polygon problem.
Another definition by Bernal (1964) is similar to the previous one, in which he was interested in the shapes of holes left in irregular close-packed arrangements of spheres. It is stated as a convex polyhedron with equilateral triangular faces that can be formed by the centers of a collection of congruent spheres, whose tangencies represent ...
Layout view of a simple CMOS operational amplifier. In integrated circuit design, integrated circuit (IC) layout, also known IC mask layout or mask design, is the representation of an integrated circuit in terms of planar geometric shapes which correspond to the patterns of metal, oxide, or semiconductor layers that make up the components of the integrated circuit.