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  2. Numerical aperture - Wikipedia

    en.wikipedia.org/wiki/Numerical_aperture

    The numerical aperture with respect to a point P depends on the half-angle, θ1, of the maximum cone of light that can enter or exit the lens and the ambient index of refraction. As a pencil of light goes through a flat plane of glass, its half-angle changes to θ2. Due to Snell's law, the numerical aperture remains the same: NA = n1 sin θ1 ...

  3. Diffraction-limited system - Wikipedia

    en.wikipedia.org/wiki/Diffraction-limited_system

    An optical instrument is said to be diffraction-limited if it has reached this limit of resolution performance. Other factors may affect an optical system's performance, such as lens imperfections or aberrations, but these are caused by errors in the manufacture or calculation of a lens, whereas the diffraction limit is the maximum resolution ...

  4. Photoactivated localization microscopy - Wikipedia

    en.wikipedia.org/wiki/Photoactivated...

    where is the wavelength of the fluorescent emission and NA is the numerical aperture of the microscope. The theoretical resolution limit at the shortest practical excitation wavelength is around 150 nm in the lateral dimension and approaching 400 nm in the axial dimension (if using an objective having a numerical aperture of 1.40 and the ...

  5. Angular resolution - Wikipedia

    en.wikipedia.org/wiki/Angular_resolution

    Angular resolution. A series of images representing the magnification of M87* with an angular size of some microarcseconds, comparable to viewing a tennis ball on the Moon (magnification from top left corner counter−clockwise to the top right corner). Angular resolution describes the ability of any image-forming device such as an optical or ...

  6. Multiple patterning - Wikipedia

    en.wikipedia.org/wiki/Multiple_patterning

    Multiple patterning. Multiple patterning (or multi-patterning) is a class of technologies for manufacturing integrated circuits (ICs), developed for photolithography to enhance the feature density. It is expected to be necessary for the 10 nm and 7 nm node semiconductor processes and beyond.

  7. Transmission electron microscopy - Wikipedia

    en.wikipedia.org/wiki/Transmission_electron...

    Transmission electron microscopy (TEM) is a microscopy technique in which a beam of electrons is transmitted through a specimen to form an image. The specimen is most often an ultrathin section less than 100 nm thick or a suspension on a grid. An image is formed from the interaction of the electrons with the sample as the beam is transmitted ...

  8. Light sheet fluorescence microscopy - Wikipedia

    en.wikipedia.org/wiki/Light_sheet_fluorescence...

    The expanded beam of a laser is focused in only one direction by a cylindrical lens, or by a combination of a cylindrical lens and a microscope objective as the latter is available in better optical quality and with higher numerical aperture than the first. This way a thin sheet of light or lightsheet is created in the focal region that can be ...

  9. Super-resolution microscopy - Wikipedia

    en.wikipedia.org/wiki/Super-resolution_microscopy

    Super-resolution microscopy is a series of techniques in optical microscopy that allow such images to have resolutions higher than those imposed by the diffraction limit, [1][2] which is due to the diffraction of light. [3] Super-resolution imaging techniques rely on the near-field (photon-tunneling microscopy [4] as well as those that use the ...