Ads
related to: opc hapur
Search results
Results From The WOW.Com Content Network
The OPC specification was based on the OLE, COM, and DCOM technologies developed by Microsoft Corporation for the Microsoft Windows operating system family. The specification defined a standard set of objects, interfaces e.g. IDL and methods for use in process control and manufacturing automation applications to facilitate interoperability.
The OPC Data Access Specification is the first of a group of specifications known as the OPC Classic Specifications. [1]OPC Data Access is a group of client–server standards that provides specifications for communicating real-time data from data acquisition devices such as PLCs to display and interface devices like Human–Machine Interfaces (HMI), SCADA systems [2] and also ERP/MES systems. [3]
OPC Unified Architecture (OPC UA) is a cross-platform, open-source, IEC62541 standard for data exchange from sensors to cloud applications developed by the OPC Foundation. Distinguishing characteristics are: [ 1 ]
HPV+OPC presents in one of four ways: as an asymptomatic abnormality in the mouth found by the patient or a health professional such as a dentist; with local symptoms such as pain or infection at the site of the tumor; with difficulties of speech, swallowing, and/or breathing; or as a swelling in the neck (if the cancer has spread to lymph nodes).
OPC technology is based on client / server architecture. Therefore, an OPC client, such as a trending application or spreadsheet, can retrieve data from an OPC compliant data source, such as a historian, using OPC HDA. Similar to the OPC Data Access specification, OPC Historical Data Access also uses Microsoft's DCOM to transport data. DCOM ...
The OPC Foundation (Open Platform Communications, formerly Object Linking and Embedding for Process Control [1]) is an industry consortium that creates and maintains standards for open connectivity of industrial automation devices and systems, such as industrial control systems and process control generally.
Optical proximity correction (OPC) is a photolithography enhancement technique commonly used to compensate for image errors due to diffraction or process effects. The need for OPC is seen mainly in the making of semiconductor devices and is due to the limitations of light to maintain the edge placement integrity of the original design, after ...
OPC was preceded by the Special Procedures Group (SPG), whose creation in March 1948 [1] had been authorized in December 1947 with President Harry Truman's approval of the top-secret policy paper NSC 4-A. [2] SPG was located within the CIA's Office of Special Operations (OSO), the CIA department responsible for intelligence collection, and was first used to influence the Italian election of ...