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  2. UV curing - Wikipedia

    en.wikipedia.org/wiki/UV_curing

    UV LED Curing equipment [4] Low-pressure mercury-vapor lamps generate primarily 254 nm 'UVC' energy, and are most commonly used in disinfection applications. Operated at lower temperatures and with less voltage than medium-pressure lamps, they, like all UV sources , require shielding when operated to prevent excess exposure of skin and eyes.

  3. Dental curing light - Wikipedia

    en.wikipedia.org/wiki/Dental_curing_light

    The dental LED curing lights use LED’s that produce a narrow spectrum of blue light in the 400–500 nm range (with a peak wavelength of about 460 nm), which is the useful energy range for activating the CPQ molecule most commonly used to initiate the photo-polymerization of dental monomers."

  4. File:UV curing glue kit for Huawei-Screen.jpg - Wikipedia

    en.wikipedia.org/wiki/File:UV_curing_glue_kit...

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  5. UV coating - Wikipedia

    en.wikipedia.org/wiki/UV_coating

    UV can be applied on spot locations of the paper or by flooding the page. This coating application can deepen the color of the printed area. Drying is virtually instantaneous when exposed to the correct level of UV light so projects can move quickly into the bindery.

  6. Photonic curing - Wikipedia

    en.wikipedia.org/wiki/Photonic_curing

    Photonic curing of a printed nanosilver trace on PET.. Photonic curing is the high-temperature thermal processing of a thin film using pulsed light from a flashlamp. [1] When this transient processing is done on a low-temperature substrate such as plastic or paper, it is possible to attain a significantly higher temperature than the substrate [2] can ordinarily withstand under an equilibrium ...

  7. Extreme ultraviolet lithography - Wikipedia

    en.wikipedia.org/wiki/Extreme_ultraviolet...

    Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.