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  2. List of vacuum tubes - Wikipedia

    en.wikipedia.org/wiki/List_of_vacuum_tubes

    V – Vapor (the anode is immersed in evaporating water, and the steam is collected, condensed and recycled) W – Water; The first digit (or the first two digits in double tubes) indicates the number of electrodes: 2 – Diode; 3 – Triode; 4 – Tetrode; 5 – Pentode; The last two digits are sequentially assigned. Examples:

  3. Surface condenser - Wikipedia

    en.wikipedia.org/wiki/Surface_condenser

    A surface condenser is a water-cooled shell and tube heat exchanger installed to condense exhaust steam from a steam turbine in thermal power stations. [1] [2] [3] These condensers are heat exchangers which convert steam from its gaseous to its liquid state at a pressure below atmospheric pressure. Where cooling water is in short supply, an air ...

  4. Thermal efficiency - Wikipedia

    en.wikipedia.org/wiki/Thermal_efficiency

    The thermal efficiency of modern steam turbine plants with reheat cycles can reach 47%, and in combined cycle plants, in which a steam turbine is powered by exhaust heat from a gas turbine, it can approach 60%. [4] Brayton cycle: gas turbines and jet engines The Brayton cycle is the cycle used in gas turbines and jet engines. It consists of a ...

  5. Thermal cooking - Wikipedia

    en.wikipedia.org/wiki/Thermal_cooking

    A vacuum flask cooker with the pot inside. In the mid-1990s steel thermal cookers were developed in Asia, [3] consisting of two stainless steel pots, one within the other. The inner pot is used to bring the food to the boil and the insulated outer pot is used as the container to retain heat and continue the cooking process.

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  7. Ultra-high-purity steam for oxidation and annealing - Wikipedia

    en.wikipedia.org/wiki/Ultra-high-purity_steam...

    A new approach is the use of High Temperature Steam Annealing (HSA), which uses water vapor at 250–400 °C. In HSA, water vapor applied in a furnace can improve the density of oxides without the use of hydrogen. The steam readily inserts H and O atoms into the Si/SiO 2 interface, and is much faster than FGA and comparable to the HRA process ...