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  2. Rapid thermal processing - Wikipedia

    en.wikipedia.org/wiki/Rapid_thermal_processing

    Rapid thermal anneal. Rapid thermal anneal (RTA) in rapid thermal processing is a process used in semiconductor device fabrication which involves heating a single wafer at a time in order to affect its electrical properties. Unique heat treatments are designed for different effects. Wafers can be heated in order to activate dopants, change film ...

  3. Furnace anneal - Wikipedia

    en.wikipedia.org/wiki/Furnace_anneal

    Furnaces are capable of processing many wafers at a time but each process can last between several hours and a day. Increasingly, furnace anneals are being supplanted by Rapid Thermal Anneal (RTA) or Rapid Thermal Processing (RTP). This is due to the relatively long thermal cycles of furnaces that causes the dopants that are being activated ...

  4. Dopant activation - Wikipedia

    en.wikipedia.org/wiki/Dopant_Activation

    Dopant activation is the process of obtaining the desired electronic contribution from impurity species in a semiconductor host. [1] The term is often restricted to the application of thermal energy following the ion implantation of dopants. In the most common industrial example, rapid thermal processing is applied to silicon following the ion ...

  5. Deal–Grove model - Wikipedia

    en.wikipedia.org/wiki/Deal–Grove_model

    The model was first published in 1965 by Bruce Deal and Andrew Grove of Fairchild Semiconductor, [1] building on Mohamed M. Atalla 's work on silicon surface passivation by thermal oxidation at Bell Labs in the late 1950s. [2] This served as a step in the development of CMOS devices and the fabrication of integrated circuits.

  6. Mattson Technology - Wikipedia

    en.wikipedia.org/wiki/Mattson_Technology

    Mattson Technology Inc. Mattson Technology Inc. is an American technology company which was founded in 1988 by Brad Mattson and is based in Fremont, California. The company is partly state-owned by the municipal government of Beijing. The company is both a manufacturer and supplier in the market of semiconductor equipment globally.

  7. Flash reactor - Wikipedia

    en.wikipedia.org/wiki/Flash_reactor

    The use of a rapid thermal heating process followed by their quenching/cooling is essential in many chemical engineering fields. For example, the aluminum hydroxide powder (i.e. gibbsite ) used for the preparation of an alumina-based catalyst goes through the process of thermochemical activation (TCA) to form a thermally activated product, Al 2 ...

  8. Infrared non-destructive testing of materials - Wikipedia

    en.wikipedia.org/wiki/Infrared_non-destructive...

    Active thermography is an advanced nondestructive testing procedure, which uses a thermography measurement of a tested material thermal response after its external excitation. This principle can be used also for non-contact infrared non-destructive testing (IRNDT) of materials. The IRNDT [1] method is based on an excitation of a tested material ...

  9. Conveyor belt furnace - Wikipedia

    en.wikipedia.org/wiki/Conveyor_belt_furnace

    A typical conveyor belt furnace. A conveyor belt furnace is a furnace that uses a conveyor or belt to carry process parts or material through a primary heating chamber for rapid thermal processing. It is designed for fast drying and curing of products, and has widespread use in the firing process of thick film and metallization process of solar ...