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The D-Wave One was built on early prototypes such as D-Wave's Orion Quantum Computer. The prototype was a 16-qubit quantum annealing processor, demonstrated on February 13, 2007, at the Computer History Museum in Mountain View, California. [15] D-Wave demonstrated what they claimed to be a 28-qubit quantum annealing processor on November 12 ...
The region is the biggest high-tech manufacturing center in the United States. [74][75] The unemployment rate of the region was 9.4% in January 2009 and has decreased to a record low of 2.7% as of August 2019. [76] Silicon Valley received 41% of all U.S. venture investment in 2011, and 46% in 2012. [77]
Anneal furnace, 2018. Furnace annealing is a process used in semiconductor device fabrication which consist of heating multiple semiconductor wafers in order to affect their electrical properties. Heat treatments are designed for different effects. Wafers can be heated in order to activate dopants, change film to film or film to wafer substrate ...
Watkins-Johnson Company. Watkins-Johnson Company was a designer and manufacturer of electronic devices, systems, and equipment. The company, commonly referred to as "W-J", was formed in 1957 by Dean A. Watkins and H. Richard Johnson, and was headquartered in Palo Alto, California. Its products included microwave tubes, followed by solid-state ...
Process annealing, also called intermediate annealing, subcritical annealing, or in-process annealing, is a heat treatment cycle that restores some of the ductility to a product being cold-worked so it can be cold-worked further without breaking. The temperature range for process annealing ranges from 260 °C (500 °F) to 760 °C (1400 °F ...
Rapid thermal anneal. Rapid thermal anneal (RTA) in rapid thermal processing is a process used in semiconductor device fabrication which involves heating a single wafer at a time in order to affect its electrical properties. Unique heat treatments are designed for different effects. Wafers can be heated in order to activate dopants, change film ...
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Ultra-high-purity steam, also called the clean steam, UHP steam or high purity water vapor, is used in a variety of industrial manufacturing processes that require oxidation or annealing. These processes include the growth of oxide layers on silicon wafers for the semiconductor industry, originally described by the Deal-Grove model, and for the ...