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ACS Catalysis is a monthly peer-reviewed scientific journal established in 2011 by the American Chemical Society. The journal covers research on all aspects of heterogeneous, homogeneous, and biocatalysis. [1] The editor-in-chief is Cathleen Crudden, who assumed the position in early 2021. [2]
J. Journal of Agricultural and Food Chemistry; Journal of Chemical & Engineering Data; Journal of Chemical Education; Journal of Chemical Information and Modeling
surfaces, interfaces, and catalysis; Electron transport, optical and electronic devices; Energy conversion and storage; It was created in 2007 when The Journal of Physical Chemistry B was split in two, largely due to the recent growth in the area of nanotechnology. The journal is published weekly, with the first issue on January 11, 2007.
The Journal of the American Chemical Society (also known as JACS) is a weekly peer-reviewed scientific journal that was established in 1879 by the American Chemical Society. [1]
The ACS Style is a set of standards for writing documents relating to chemistry, including a standard method of citation in academic publications, developed by the American Chemical Society (ACS).
Submitted manuscript must add meaningful new information above that already in the preprint Unrestricted [14] American Society of Agronomy: Unrestricted Unrestricted Unrestricted American Society for Biochemistry and Molecular Biology: Not-for-profit servers (e.g. arXiv, bioRxiv, chemRxiv, medRxiv) Unrestricted
An acid-base-nucleophile triad is a common motif for generating a nucleophilic residue for covalent catalysis. The residues form a charge-relay network to polarise and activate the nucleophile, which attacks the substrate, forming a covalent intermediate which is then hydrolysed to release the product and regenerate free
The hydrosilylation reaction can be initiated with UV light at room temperature or with heat (typical reaction temperature 120-200 °C), under moisture- and oxygen-free conditions. [7] The resulting monolayer, which is stable and inert, inhibits oxidation of the base silicon layer, relevant to various device applications.