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A depletion-load NMOS NAND gate. In integrated circuits, depletion-load NMOS is a form of digital logic family that uses only a single power supply voltage, unlike earlier NMOS (n-type metal-oxide semiconductor) logic families that needed more than one different power supply voltage.
The mode can be determined by the sign of the threshold voltage (gate voltage relative to source voltage at the point where an inversion layer just forms in the channel): for an N-type FET, enhancement-mode devices have positive thresholds, and depletion-mode devices have negative thresholds; for a P-type FET, enhancement-mode have negative ...
The major drawback with NMOS (and most other logic families) is that a direct current must flow through a logic gate even when the output is in a steady state (low in the case of NMOS). This means static power dissipation, i.e. power drain even when the circuit is not switching, leading to high power consumption.
In an n-channel "depletion-mode" device, a negative gate-to-source voltage causes a depletion region to expand in width and encroach on the channel from the sides, narrowing the channel. If the active region expands to completely close the channel, the resistance of the channel from source to drain becomes large, and the FET is effectively ...
In the depletion-load NMOS logic realization in the middle below, the switches are the transistors T2 and T3, and the transistor T1 fulfills the function of the pull-up resistor. In the CMOS realization on the right below, the switches are the n-type transistors T3 and T4, and the pull-up resistor is made up of the p-type transistors T1 and T2 ...
JFETs are sometimes referred to as depletion-mode devices, as they rely on the principle of a depletion region, which is devoid of majority charge carriers. The depletion region has to be closed to enable current to flow. JFETs can have an n-type or p-type channel. In the n-type, if the voltage applied to the gate is negative with respect to ...
Created Date: 8/30/2012 4:52:52 PM
MOSFET (PMOS and NMOS) demonstrations Date Channel length Oxide thickness [1] MOSFET logic Researcher(s) Organization Ref; June 1960: 20,000 nm: 100 nm: PMOS: Mohamed M. Atalla, Dawon Kahng: Bell Telephone Laboratories [2] [3] NMOS: 10,000 nm: 100 nm: PMOS Mohamed M. Atalla, Dawon Kahng: Bell Telephone Laboratories [4] NMOS May 1965: 8,000 nm ...