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The basic components of a typical electron-beam processing device include: [1] an electron gun (consisting of a cathode, grid, and anode), used to generate and accelerate the primary beam; and, a magnetic optical (focusing and deflection) system, used for controlling the way in which the electron beam impinges on the material being processed ...
Electron beam therapy is performed using a medical linear accelerator.The same device can also be used to produce high energy photon beams. When electrons are required, the X-ray target is retracted out of the beam and the electron beam is collimated with a piece of apparatus known as an applicator or an additional collimating insert, constructed from a low melting point alloy.
Electron beam technology is used in cable-isolation treatment, in electron lithography of sub-micrometer and nano-dimensional images, in microelectronics for electron-beam curing of color printing [1] and for the fabrication and modification of polymers, including liquid-crystal films, among many other applications.
Intraoperative electron radiation therapy is the application of electron radiation directly to the residual tumor or tumor bed during cancer surgery. [1] [2] Electron beams are useful for intraoperative radiation treatment because, depending on the electron energy, the dose falls off rapidly behind the target site, therefore sparing underlying healthy tissue.
The beam is made up of a spectrum of energies: the maximum energy is approximately equal to the beam's maximum electric potential within a linear accelerator times the electron charge. For instance, a 1 megavolt beam will produce photons with a maximum energy around 1 MeV. In practice, the mean X-ray energy is about one-third of the maximum energy.
Megavoltage X-rays are produced by linear accelerators ("linacs") operating at voltages in excess of 1000 kV (1 MV) range, and therefore have an energy in the MeV range. The voltage in this case refers to the voltage used to accelerate electrons in the linear accelerator and indicates the maximum possible energy of the photons which are subsequently produced. [1]
Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam. [1] Ion beam deposition setup with mass separator. An ion beam deposition apparatus typically consists of an ion source, ion optics, and the deposition target. Optionally a mass analyzer can be incorporated. [2]
The linear accelerator electron gun and smaller booster ring used to bring the beam to an operating energy of 6 GeV are constructed within the main ring. Research at the ESRF focuses, in large part, on the use of X-ray radiation in fields as diverse as protein crystallography , earth science , paleontology , materials science , chemistry and ...