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In chemistry, a photoinitiator is a molecule that creates reactive species (free radicals, cations or anions) when exposed to radiation (UV or visible). Synthetic photoinitiators are key components in photopolymers (for example, photo-curable coatings, adhesives and dental restoratives).
A photopolymer or light-activated resin is a polymer that changes its properties when exposed to light, often in the ultraviolet or visible region of the electromagnetic spectrum. [1] These changes are often manifested structurally, for example hardening of the material occurs as a result of cross-linking when exposed to light.
Cationic polymerization is used in the curing of epoxy resins in the presence of UV in the industry. [16] Light energy from UV breaks apart photoinitiaters, forming an acidic solution which then donates a proton to the polymer. The monomers then attach themselves to the polymer, forming longer and longer chains leading to a cross-linked network.
Stereolithography (SLA or SL; also known as vat photopolymerisation, [1] optical fabrication, photo-solidification, or resin printing) is a form of 3D printing technology used for creating models, prototypes, patterns, and production parts in a layer by layer fashion using photochemical processes by which light causes chemical monomers and ...
Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.
Negative refers to a photoresist whereby the parts exposed to UV become cross-linked, while the remainder of the film remains soluble and can be washed away during development. As shown in the structural diagram, SU-8 derives its name from the presence of 8 epoxy groups. This is a statistical average per moiety.
One very common positive photoresist used with the I, G and H-lines from a mercury-vapor lamp is based on a mixture of diazonaphthoquinone (DNQ) and novolac resin (a phenol formaldehyde resin). DNQ inhibits the dissolution of the novolac resin, but upon exposure to light, the dissolution rate increases even beyond that of pure novolac.
In photo nanoimprint lithography (P-NIL), a UV-curable liquid resist is applied to the sample substrate, and the mold is normally made of transparent material like fused silica or PDMS. After the mold and the substrate are pressed together, the resist is cured in UV light and becomes solid.