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Data sanitization involves the secure and permanent erasure of sensitive data from datasets and media to guarantee that no residual data can be recovered even through extensive forensic analysis. [1] Data sanitization has a wide range of applications but is mainly used for clearing out end-of-life electronic devices or for the sharing and use ...
Data remanence is the residual representation of digital data that remains even after attempts have been made to remove or erase the data. This residue may result from data being left intact by a nominal file deletion operation, by reformatting of storage media that does not remove data previously written to the media, or through physical properties of the storage media that allow previously ...
Data cleansing or data cleaning is the process of identifying and correcting (or removing) corrupt, inaccurate, or irrelevant records from a dataset, table, or database. It involves detecting incomplete, incorrect, or inaccurate parts of the data and then replacing, modifying, or deleting the affected data. [ 1 ]
Redaction or sanitization is the process of removing sensitive information from a document so that it may be distributed to a broader audience. It is intended to ...
A clean-in-place unit on display at the World of Coca-Cola in Atlanta. Clean-in-place (CIP) is an automated method of cleaning the interior surfaces of pipes, vessels, equipment, filters and associated fittings, without major disassembly. CIP is commonly used for equipment such as piping, tanks, and fillers.
Plasma cleaning is the removal of impurities and contaminants from surfaces through the use of an energetic plasma or dielectric barrier discharge (DBD) plasma created from gaseous species. Gases such as argon and oxygen , as well as mixtures such as air and hydrogen/nitrogen are used.
The two-season Purge series takes place in the years between Anarchy and The Purge: Election Year. The show’s first season follows a group of Americans on Purge Night 2027 as they struggle to ...
Provided the RCA clean is performed with high-purity chemicals and clean glassware, it results in a very clean wafer surface while the wafer is still submersed in water. The rinsing and drying steps must be performed correctly (e.g., with flowing water) since the surface can be easily recontaminated by organics and particulates floating on the ...