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The basic technique is to combine a high color-rendering index (CRI) high-intensity discharge lamp (HID lamp) and ballast with a condenser and collector Fresnel lens, a single color LCD removed from a common computer display or electronic device and a triplet lens. This design can also be used in low cost (around US$200) LCD projectors. [11]
The smaller field of electron beam writing makes for very slow pattern generation compared with photolithography (the current standard) because more exposure fields must be scanned to form the final pattern area (≤mm 2 for electron beam vs. ≥40 mm 2 for an optical mask projection scanner). The stage moves in between field scans.