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  2. Plasma etching - Wikipedia

    en.wikipedia.org/wiki/Plasma_etching

    Argon plasma etching has reported to enhance contact angle from 52 deg to 68 deg, [7] and, Oxygen plasma etching to reduce contact angle from 52 deg to 19 deg for CFRP composites for bone plate applications. Plasma etching has been reported to reduce the surface roughness from hundreds of nanometers to as much lower as 3 nm for metals. [8]

  3. Etching (microfabrication) - Wikipedia

    en.wikipedia.org/wiki/Etching_(microfabrication)

    The plasma produces energetic free radicals, neutrally charged, that react at the surface of the wafer. Since neutral particles attack the wafer from all angles, this process is isotropic. Plasma etching can be isotropic, i.e., exhibiting a lateral undercut rate on a patterned surface approximately the same as its downward etch rate, or can be ...

  4. Printed circuit board manufacturing - Wikipedia

    en.wikipedia.org/wiki/Printed_circuit_board...

    The de-smear process ensures that a good connection is made to the copper layers when the hole is plated through. On high reliability boards a process called etch-back is performed chemically with a potassium permanganate based etchant or plasma etching. The etch-back removes resin and the glass fibers so that the copper layers extend into the ...

  5. Reactive-ion etching - Wikipedia

    en.wikipedia.org/wiki/Reactive-ion_etching

    Reactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching. RIE uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure by an electromagnetic field.

  6. Category:Plasma processing - Wikipedia

    en.wikipedia.org/wiki/Category:Plasma_processing

    Print/export Download as PDF; Printable version; In other projects Wikidata item; Appearance. ... Plasma etching; Plasma gasification commercialization;

  7. Plasma processing - Wikipedia

    en.wikipedia.org/wiki/Plasma_processing

    Plasma processing is a plasma-based material processing technology that aims at modifying the chemical and physical properties of a surface. [1] Plasma processing techniques include: Plasma activation; Plasma ashing; Plasma cleaning; Plasma electrolytic oxidation; Plasma etching; Plasma functionalization; Plasma polymerization; Corona treatment ...

  8. Plasma (physics) - Wikipedia

    en.wikipedia.org/wiki/Plasma_(physics)

    Download as PDF; Printable version ... The underlying process is the ... integrated circuit manufacturing industries for plasma etching and plasma enhanced chemical ...

  9. List of plasma physics articles - Wikipedia

    en.wikipedia.org/wiki/List_of_plasma_physics...

    New Horizons, Plasma and high energy particle spectrometer suite (PAM) Nitrogen–phosphorus detector; Nonequilibrium Gas and Plasma Dynamics Laboratory; Non-line-of-sight propagation; Non-thermal microwave effect; Nonthermal plasma, Cold plasma; Nuclear fusion, Bremsstrahlung losses in quasineutral, isotropic plasmas, deuterium plasma; Nuclear ...