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With the introduction of high κ metal gates, a new degradation mechanism has become more important, referred to as PBTI (for positive bias temperature instabilities), which affects nMOS transistor when positively biased. In this case, no interface states are generated and 100% of the Vth degradation may be recovered.
A common file format for storing the lookup tables is the Liberty [2] [3] format. A very simple model called the K-factor model is sometimes used. This approximates the delay as a constant plus k times the load capacitance. A more complex model called Delay Calculation Language, [4] or DCL, calls a user-defined program whenever a delay value is ...
Caltech Intermediate Form (CIF) is a file format for describing integrated circuits. CIF provides a limited set of graphics primitives that are useful for describing the two-dimensional shapes on the different layers of a chip. The format allows hierarchical description, which makes the representation concise.
Open Artwork System Interchange Standard (OASIS [3]) is a binary file format used for specification of data structures for photomask production. [4] It's used to represent a pattern an interchange and encapsulation format for hierarchical integrated circuit mask layout information produced during integrated circuit design that is further used for manufacturing of a photomask.
A process design kit (PDK) is a set of files used within the semiconductor industry to model a fabrication process for the design tools used to design an integrated circuit.
WASHINGTON (Reuters) -A U.S. appeals court on Monday threw out a $2.18 billion patent-infringement award won by patent owner VLSI Technology against Intel Corp, overturning one of the largest ...
Mask data preparation (MDP), also known as layout post processing, is the procedure of translating a file containing the intended set of polygons from an integrated circuit layout into set of instructions that a photomask writer can use to generate a physical mask.
[2] Certain semiconductor fabrication technologies also include deep trench isolation , a related feature often found in analog integrated circuits . The effect of the trench edge has given rise to what has recently been termed the "reverse narrow channel effect" [ 3 ] or "inverse narrow width effect". [ 4 ]