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Ion implantation setup with mass separator. Ion implantation equipment typically consists of an ion source, where ions of the desired element are produced, an accelerator, where the ions are electrostatically accelerated to a high energy or using radiofrequency, and a target chamber, where the ions impinge on a target, which is the material to be implanted.
Ion Implantation is a technique extensively used in the field of materials science for material modification. The effect it has on nanomaterials allows manipulation of mechanical, electronic, morphological, and optical properties. [1]
Ion implantation is an effective surface treatment technique that be used to enhance the surface properties of biomaterials. [ 2 ] [ 11 ] [ 12 ] [ 13 ] The unique advantage of plasma modification is that the surface properties and biocompatibility can be enhanced selectively while the favorable bulk attributes of the materials such as strength ...
Diffusion vs. Transport. In biology, an ion transporter is a transmembrane protein that moves ions (or other small molecules) across a biological membrane to accomplish many different biological functions, including cellular communication, maintaining homeostasis, energy production, etc. [1] There are different types of transporters including pumps, uniporters, antiporters, and symporters.
Mechanisms of transport: (L) channel, (M) ionophore/carrier, and (R) detergent. Passive transport of ions across a membrane can take place by three main mechanisms: by ferrying, through defects in a disrupted membrane, or through a defined trajectory; these corresponds to ionophore, detergent, and ion channel transporters.
Ion beam mixing can be further enhanced by heat spike effects [4] Ion mixing (IM) is essentially similar in result to interdiffusion, hence most models of ion mixing involve an effective diffusion coefficient that is used to characterize thickness of the reacted layer as a function of ion beam implantation over a period of time. [3]
The rate of ion transport through the channel is very high (often 10 6 ions per second or greater). Ions pass through channels down their electrochemical gradient , which is a function of ion concentration and membrane potential, "downhill", without the input (or help) of metabolic energy (e.g. ATP , co-transport mechanisms, or active transport ...
PIII-process with ECR-plasma source and magnetron. Plasma-immersion ion implantation (PIII) [1] or pulsed-plasma doping (pulsed PIII) is a surface modification technique of extracting the accelerated ions from the plasma by applying a high voltage pulsed DC or pure DC power supply and targeting them into a suitable substrate or electrode with a semiconductor wafer placed over it, so as to ...