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The sublimation that occurs at the solid-gas boundary (critical sublimation point) (corresponding to boiling in vaporization) may be called rapid sublimation, and the substance sublimes rapidly. The words "gradual" and "rapid" have acquired special meanings in this context and no longer describe the rate of sublimation. [citation needed]
Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.
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