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A clean-in-place unit on display at the World of Coca-Cola in Atlanta. Clean-in-place (CIP) is an automated method of cleaning the interior surfaces of pipes, vessels, equipment, filters and associated fittings, without major disassembly. CIP is commonly used for equipment such as piping, tanks, and fillers.
Chemical tube cleaning is understood to be the use of cleaning liquids or chemicals for removing layers and deposits. A typical example is the deliming of a coffee maker where scale is removed by means of acetic acid or citric acid. Depending on the field of application and tube material, special cleaning liquids may be used which also require ...
A process flow diagram (PFD) is a diagram commonly used in chemical and process engineering to indicate the general flow of plant processes and equipment. The PFD displays the relationship between major equipment of a plant facility and does not show minor details such as piping details and designations.
Cleaning can also be simple: the cleaning processes are integrated into other processes, as it is the case with electroplating or galvanising, where it usually serves as a pre-treatment step. The following procedure is quite common: Pre-cleaning; Main cleaning; Rinsing; Rinsing with deionised water; Rinsing with corrosion protection; Drying
Limescale buildup in a PVC pipe. The presence of certain metal ions like calcium and magnesium, principally as bicarbonates, chlorides, and sulfates, in water causes a variety of problems. [1] Hard water leads to the buildup of limescale, which can foul plumbing, and promote galvanic corrosion. [2]
Piping and instrumentation diagram of pump with storage tank. Symbols according to EN ISO 10628 and EN 62424. A more complex example of a P&ID. A piping and instrumentation diagram (P&ID) is defined as follows: A diagram which shows the interconnection of process equipment and the instrumentation used to control the process.
It is a jointless, seamless pipe lining within an existing pipe. As one of the most widely used rehabilitation methods, CIPP has applications in sewer, water, gas, chemical and district heating pipelines ranging in diameter from 0.1 to 2.8 meters (2–110 inches).
The RCA clean is a standard set of wafer cleaning steps which need to be performed before high-temperature processing steps (oxidation, diffusion, CVD) of silicon wafers in semiconductor manufacturing. Werner Kern developed the basic procedure in 1965 while working for RCA, the Radio Corporation of America.