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  2. Everything you can clean with a steam cleaner - AOL

    www.aol.com/everything-clean-steam-cleaner...

    Attachments: Steam cleaners often come with attachments such as squeegees, cloths, cleaning pads, scrub brushes of varying sizes, a hose and a nozzle. Some come with all of these and others only ...

  3. Kärcher - Wikipedia

    en.wikipedia.org/wiki/Kärcher

    In 1950, the cleaning technology division was established with the development of the first European hot water high-pressure cleaner, the DS 350. [11] From the mid-1950s to the 1970s, the production of steam generators for industry and construction was a key focus for the company, while cleaning technology only later became Kärcher's main revenue-generating sector.

  4. Vapor steam cleaner - Wikipedia

    en.wikipedia.org/wiki/Vapor_steam_cleaner

    The steam helps soak the pad and dirt is drawn off ground. Unlike regular mops, steam mops do not leave a residue on the floor and often clean through the dirt. The heat of the steam can kill about 99 percent of the bacteria and dust mites. Steam mops can disinfect floors, restore shine, kill dust mites, and remove some stains. Some feature a ...

  5. Steam cleaning - Wikipedia

    en.wikipedia.org/wiki/Steam_cleaning

    In ovens, steam cleaning is an alternative to catalysis and pyrolysis for making a self-cleaning oven, and uses a lower temperature (approximately 100 Celsius) compared to catalysis (approx. 200 Celsius) and pyrolysis (approx. 500 Celsius). [3]

  6. Stanley Steemer - Wikipedia

    en.wikipedia.org/wiki/Stanley_Steemer

    Stanley Steemer is an American company that provides carpet cleaning, tile and grout cleaning, upholstery cleaning, hardwood floor cleaning and air duct cleaning. The company also does water damage restoration and sells a line of cleaning products for home and office use. The company has over 280 corporate-owned and franchised locations in 49 ...

  7. RCA clean - Wikipedia

    en.wikipedia.org/wiki/RCA_clean

    The RCA clean is a standard set of wafer cleaning steps which need to be performed before high-temperature processing steps (oxidation, diffusion, CVD) of silicon wafers in semiconductor manufacturing. Werner Kern developed the basic procedure in 1965 while working for RCA, the Radio Corporation of America.

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