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This output should be enclosed within reference tags (<ref> and </ref>) in the same way as Template:Cite journal. Note that patent application numbers are generally different from patent numbers. If you need this, please use the Template:Cite patent template with the optional application parameter. Examples: {{patent|US|6556992}} results in; US ...
[[Category:Patent law templates]] to the <includeonly> section at the bottom of that page. Otherwise, add <noinclude>[[Category:Patent law templates]]</noinclude> to the end of the template code, making sure it starts on the same line as the code's last character.
A patent applicant may include a copyright notice or mask work notice, but only if it also includes the following authorization, expressly permitting the reproduction of the patent: [9] A portion of the disclosure of this patent document contains material which is subject to (copyright or mask work) protection.
{{Cite patent}}, creates links to US and other patents on the espacenet database {{Citeref patent}}, for an inline citations to a patent bibliography {{EPO Register}}, to include a link to the European Patent Register entry of a European patent or patent application {}, a generic template for general use referring to world's patent offices
General patent template for citing patents or patent applications from any country is drawn from the espacenet database. Template parameters Parameter Description Type Status Country code country country-code country two-letter country code (ISO 3166-1 alpha-2); the top 10 countries by patent application in 2011 were: JP=Japan, CN=China, US=United States, KR=South Korea, DE=Germany, FR=France ...
This page was last edited on 9 November 2024, at 14:28 (UTC).; Text is available under the Creative Commons Attribution-ShareAlike 4.0 License; additional terms may apply.