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Ammonium bifluoride is a component of some etchants. It attacks silica component of glass: SiO 2 + 4 [NH 4][HF 2] → SiF 4 + 4 [NH 4]F + 2 H 2 O. Potassium bifluoride is a related more commonly used etchant. Ammonium bifluoride has been considered as an intermediate in the production of hydrofluoric acid from hexafluorosilicic acid.
Glass etching, or "French embossing", is a popular technique developed during the mid-1800s that is still widely used in both residential and commercial spaces today. Glass etching comprises the techniques of creating art on the surface of glass by applying acidic, caustic, or abrasive substances.
Buffered oxide etch (BOE), also known as buffered HF or BHF, is a wet etchant used in microfabrication. It is a mixture of a buffering agent, such as ammonium fluoride NH 4 F, and hydrofluoric acid (HF). Its primary use is in etching thin films of silicon nitride (Si 3 N 4) or silicon dioxide (SiO 2), by the reaction: SiO 2 + 4HF + 2NH 4 F → ...
This substance is commonly called "commercial ammonium fluoride". The word "neutral" is sometimes added to "ammonium fluoride" to represent the neutral salt [NH 4]F as opposed to the "acid salt" (NH 4 HF 2). The acid salt is usually used in preference to the neutral salt in the etching of glass and related silicates. This property is shared ...
Other sources include glass-etching or chrome-cleaning agents like ammonium bifluoride or hydrofluoric acid, [12] [13] industrial exposure to fluxes used to promote the flow of a molten metal on a solid surface, volcanic ejecta (for example, in cattle grazing after an 1845–1846 eruption of Hekla and the 1783–1784 flood basalt eruption of ...
Etching tanks used to perform Piranha, hydrofluoric acid or RCA clean on 4-inch wafer batches at LAAS technological facility in Toulouse, France. Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module in fabrication, and every wafer ...