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  2. Wafer (electronics) - Wikipedia

    en.wikipedia.org/wiki/Wafer_(electronics)

    Silicon wafers are generally not 100% pure silicon, but are instead formed with an initial impurity doping concentration between 10 13 and 10 16 atoms per cm 3 of boron, phosphorus, arsenic, or antimony which is added to the melt and defines the wafer as either bulk n-type or p-type. [27]

  3. Flexible solar cell research - Wikipedia

    en.wikipedia.org/wiki/Flexible_solar_cell_research

    Crystalline silicon (c-Si) is an extremely popular semiconductor made into wafers, which are then used in the manufacturing of 95% of the world’s photovoltaics. [4] Due to its prevalence in the solar cell industry, it would appear to be an ideal substrate for flexible solar cells.

  4. Polycrystalline silicon - Wikipedia

    en.wikipedia.org/wiki/Polycrystalline_silicon

    The use of polycrystalline silicon in the production of solar cells requires less material and therefore provides higher profits and increased manufacturing throughput. Polycrystalline silicon does not need to be deposited on a silicon wafer to form a solar cell, rather it can be deposited on other, cheaper materials, thus reducing the cost.

  5. Hemlock Semiconductor - Wikipedia

    en.wikipedia.org/wiki/Hemlock_Semiconductor

    Dow Corning announced that June 1, 2016 would be "day one" such that [6] Dow Chemical Company will assume 100% ownership of the Dow Corning Corporation, concluding the 73-year joint venture between Dow Chemical and Corning Inc. Hemlock Semiconductor continues as an independently run entity with two shareholders: Corning Inc. owns 80.5%, and ...

  6. Ultra-high-purity steam for oxidation and annealing - Wikipedia

    en.wikipedia.org/wiki/Ultra-high-purity_steam...

    Oxidation of silicon is a common and frequent step in the manufacture of integrated circuits (IC). The goal of oxidation is to grow a high quality, uniform oxide layer on a silicon substrate. During oxidation, a chemical reaction between the oxidants and the silicon atoms produces a layer of oxide on the silicon surface of the wafer.

  7. Thermal oxidation - Wikipedia

    en.wikipedia.org/wiki/Thermal_oxidation

    Vertical furnaces solve this problem by having wafer sitting horizontally, and then having the gas flow in the furnace flowing from top to bottom, significantly damping any thermal convections. Vertical furnaces also allow the use of load locks to purge the wafers with nitrogen before oxidation to limit the growth of native oxide on the Si surface.

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